SCHEMBL10027355

SCHEMBL10027355

C=C(C)C(=O)OC(C)(C)C(=O)OC1CC2CCC1(C)OC2=O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1141893 0.85 OPRM1 (0.32)
SCHEMBL14286225 0.84
SCHEMBL10027353 0.84
SCHEMBL12430035 0.83 FKBP1A (0.30)
SCHEMBL13817673 0.83 SMN1; SMN2 (0.32)
SCHEMBL10061295 0.79 PAX8 (0.36)
SCHEMBL111846 0.79 FKBP1A (0.30)
SCHEMBL12140430 0.77
SCHEMBL15268383 0.77
SCHEMBL11960974 0.76

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 24 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8193286-B2 Acrylic star polymer NIPPON SODA CO., LTD. (JP) 2012-06-05 US disclosed
US-8193286-B2 Acrylic star polymer NIPPON SODA CO., LTD. (JP) 2012-06-05 US disclosed
US-8067515-B2 Method of producing an acrylic acid-based polymer NIPPON SODA CO., LTD. (JP) 2011-11-29 US disclosed
US-8067515-B2 Method of producing an acrylic acid-based polymer NIPPON SODA CO., LTD. (JP) 2011-11-29 US disclosed
US-20110152388-A1 Multibranched polymer and method for producing the same NIPPON SODA CO., LTD. (JP) 2011-06-23 US disclosed
US-20110098413-A1 Acrylic star polymer NIPPON SODA CO., LTD (JP) 2011-04-28 US disclosed
US-20110098413-A1 Acrylic star polymer NIPPON SODA CO., LTD (JP) 2011-04-28 US disclosed
US-7919570-B2 narrowly dispersed; controlled molecular weight; ionic conductivity, shape stability; battery adhesive or binder; 1,1,2,2-tetrakis(4-hydroxyphenyl)ethane or pentaerythritol reacted with bromoisobutyroyl bromide for core; living radical polymerization of acrylate or a styrene at halogen atoms as the arms NIPPON SODA CO., LTD. (JP) 2011-04-05 US disclosed
US-7919570-B2 narrowly dispersed; controlled molecular weight; ionic conductivity, shape stability; battery adhesive or binder; 1,1,2,2-tetrakis(4-hydroxyphenyl)ethane or pentaerythritol reacted with bromoisobutyroyl bromide for core; living radical polymerization of acrylate or a styrene at halogen atoms as the arms NIPPON SODA CO., LTD. (JP) 2011-04-05 US disclosed
US-20110046333-A1 ACRYLIC ACID-BASED POLYMER AND METHOD OF PRODUCING THE SAME NIPPON SODA CO., LTD. (JP) 2011-02-24 US disclosed
US-20100210805-A1 METHOD FOR PRODUCING STAR POLYMER NIPPON SODA CO., LTD. (JP) 2010-08-19 US disclosed
US-20090209726-A1 ACRYLIC STAR POLYMER NIPPON SODA CO., LTD. (JP) 2009-08-20 US disclosed
US-20090209726-A1 ACRYLIC STAR POLYMER NIPPON SODA CO., LTD. (JP) 2009-08-20 US disclosed
US-20090111961-A1 Acrylic Acid-Based Polymer and Method of Producing the Same NIPPON SODA CO., LTD. (JP) 2009-04-30 US disclosed
US-20090111961-A1 Acrylic Acid-Based Polymer and Method of Producing the Same NIPPON SODA CO., LTD. (JP) 2009-04-30 US disclosed
US-7494759-B2 Positive resist compositions and process for the formation of resist patterns with the same TOKYO OHKA KOGYO CO., LTD. (JP) 2009-02-24 US disclosed
US-7494759-B2 Positive resist compositions and process for the formation of resist patterns with the same TOKYO OHKA KOGYO CO., LTD. (JP) 2009-02-24 US disclosed
US-20080214685-A1 Multibrached Polymer and Method for Producing the Same NIPPON SODA CO., LTD. (JP) 2008-09-04 US disclosed
US-20070224538-A1 Positive Resist Compositions and Process for the Formation of Resist Patterns With the Same TOKYO OHKA KOGYO CO., LTD. (JP) 2007-09-27 US disclosed
US-20070224538-A1 Positive Resist Compositions and Process for the Formation of Resist Patterns With the Same TOKYO OHKA KOGYO CO., LTD. (JP) 2007-09-27 US disclosed