SCHEMBL10033037

SCHEMBL10033037

Clc1cccc(-c2nc(-c3ccccc3)c(-c3ccccc3)n2-n2c(-c3cccc(Cl)c3)nc(-c3ccccc3)c2-c2ccccc2)c1

nearest known ligand 0.60

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GAA P10253 3/20 0.51
MGAM O43451 2/20 0.51
SI P14410 2/20 0.51
MGAM2 Q2M2H8 2/20 0.51
KDM4E B2RXH2 4/20 0.49
LMNA P02545 2/20 0.49
HTT P42858 1/20 0.49
ADORA1 P30542 4/20 0.48
ADORA2A P29274 3/20 0.48
ALDH1A1 P00352 2/20 0.46
HPGD P15428 2/20 0.46
MDM2 Q00987 1/20 0.45
ADORA2B P29275 1/20 0.44
PTGS1 P23219 1/20 0.43
PTGS2 P35354 1/20 0.43
BCHE P06276 1/20 0.43
NPC1 O15118 1/20 0.42
TP53 P04637 1/20 0.42
TSHR P16473 1/20 0.42
NFKB1 P19838 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4597351 0.82 BCHE (0.45) GAAKDM4ELMNAHTTALDH1A1
SCHEMBL31467384 0.80 HSD11B1 (0.54) GAAKDM4ELMNAALDH1A1HPGD
SCHEMBL2689067 0.80 HSD11B1 (0.54) GAAKDM4ELMNAALDH1A1HPGD
SCHEMBL4869355 0.79 ADORA2A (0.46) KDM4EADORA1ADORA2AALDH1A1TP53
SCHEMBL6370851 0.76 GAA (0.40) GAAMGAMSIMGAM2KDM4E
SCHEMBL63728 0.75 HSD11B1 (0.49) KDM4ELMNAALDH1A1HPGDPTGS1
SCHEMBL29732755 0.75 HSD11B1 (0.49) KDM4ELMNAALDH1A1HPGDPTGS1
SCHEMBL23474673 0.74 KDM4E (0.69) GAAKDM4ELMNAADORA1ADORA2A
SCHEMBL30125120 0.74 KDM4E (0.69) GAAKDM4ELMNAADORA1ADORA2A
SCHEMBL31734206 0.74 MGAM (0.41) GAAMGAMSIMGAM2KDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8092981-B2 Negative photoresist composition and method of manufacturing array substrate using the same SAMSUNG ELECTRONICS CO., LTD. (KR) 2012-01-10 US disclosed
US-8092981-B2 Negative photoresist composition and method of manufacturing array substrate using the same SAMSUNG ELECTRONICS CO., LTD. (KR) 2012-01-10 US disclosed
US-20090176337-A1 NEGATIVE PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING ARRAY SUBSTRATE USING THE SAME SAMSUNG ELECTRONICS CO., LTD. (KR) 2009-07-09 US disclosed
US-20090176337-A1 NEGATIVE PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING ARRAY SUBSTRATE USING THE SAME SAMSUNG ELECTRONICS CO., LTD. (KR) 2009-07-09 US disclosed