SCHEMBL1003379

SCHEMBL1003379

C[N+](C)(C)Cc1ccccc1.O=S(=O)(O)C(F)(F)CO

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.52
KDM4E B2RXH2 2/20 0.52
TDP1 Q9NUW8 1/20 0.52
CES1 P23141 1/20 0.35
FAAH O00519 1/20 0.34
PRSS1 P07477 1/20 0.34
PRSS2 P07478 1/20 0.34
ELANE P08246 1/20 0.34
PRTN3 P24158 1/20 0.34
PRSS3 P35030 1/20 0.34
CHRNB2 P17787 1/20 0.34
CHRNA4 P43681 1/20 0.34
NR1I2 O75469 2/20 0.34
MEN1 O00255 1/20 0.33
KMT2A Q03164 1/20 0.33
TSHR P16473 1/20 0.33
SMN1; SMN2 Q16637 1/20 0.33
PTPN1 P18031 2/20 0.33
NR1H3 Q13133 1/20 0.33
HSD11B1 P28845 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Trifluoromethanesulfonic Acid SCHEMBL1130294 0.87 ALDH1A1 (0.59) ALDH1A1KDM4ETDP1CES1FAAH
SCHEMBL1003378 0.86 ALDH1A1 (0.50) ALDH1A1KDM4ETDP1CES1FAAH
Sulfuric Acid SCHEMBL229800 0.81 KDM4E (0.71) ALDH1A1KDM4ETDP1CES1FAAH
SCHEMBL16195177 0.80 KDM4E (0.44) ALDH1A1KDM4ETDP1CES1MEN1
Sulfuric Acid SCHEMBL7637641 0.79 KDM4E (0.68) ALDH1A1KDM4ETDP1FAAHPRSS1
SCHEMBL332135 0.79 ALDH1A1 (0.68) ALDH1A1KDM4ETDP1CHRNB2CHRNA4
SCHEMBL5525260 0.79 KDM4E (0.49) ALDH1A1KDM4ETDP1NR1H3HSD11B1
SCHEMBL1001527 0.78 KDM4E (0.41) ALDH1A1KDM4ETDP1MEN1KMT2A
Sulfuric Acid SCHEMBL229801 0.78 KDM4E (0.65) ALDH1A1KDM4ETDP1CES1CHRNB2
SCHEMBL330945 0.78 KDM4E (0.65) ALDH1A1KDM4ETDP1FAAHPRSS1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-111440104-B Novel onium salt, chemically amplified resist composition, and pattern forming method 信越化学工业株式会社 2023-03-24 CN disclosed
CN-111440104-A Novel onium salt, chemically amplified resist composition, and pattern forming method 信越化学工业株式会社 2020-07-24 CN disclosed
US-9164384-B2 Patterning process and resist composition SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-10-20 US disclosed
US-20140322650-A1 PATTERNING PROCESS AND RESIST COMPOSITION SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-10-30 US disclosed
US-8173354-B2 Sulfonium salt, resist composition, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-05-08 US disclosed
US-20110008735-A1 SULFONIUM SALT, RESIST COMPOSITION, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2011-01-13 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20110008735-A1 SULFONIUM SALT, RESIST COMPOSITION, AND PATTERNING PROCESS ETV6, ETV1, VPS4B ALDH1A1 4625/4885KDM4E 1943/4885TDP1 2411/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.