SCHEMBL10040437

SCHEMBL10040437

CCC(C)(C)C(=O)OC12CC3CC(CC(COCOCC(C)(C)C)(C3)C1)C2

nearest known ligand 0.39

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
DPP8 Q6V1X1 1/20 0.32
DPP9 Q86TI2 1/20 0.32
ALDH1A1 P00352 1/20 0.30
DPP4 P27487 1/20 0.30
SCN9A Q15858 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10040428 0.86 DPP8 (0.34) DPP8DPP9DPP4
SCHEMBL10040432 0.84 ALDH1A1 (0.36) DPP8DPP9ALDH1A1DPP4
SCHEMBL12309562 0.82
SCHEMBL18195521 0.81 PKM (0.42) DPP8DPP9ALDH1A1DPP4
SCHEMBL10447923 0.81 ALDH1A1 (0.33) DPP8DPP9ALDH1A1DPP4SCN9A
SCHEMBL118806 0.80 GAA (0.35) DPP8DPP9ALDH1A1DPP4
SCHEMBL13563631 0.79 DPP8 (0.33) DPP8DPP9DPP4
SCHEMBL12309602 0.79 ALDH1A1 (0.36) DPP8DPP9ALDH1A1SCN9A
SCHEMBL15280968 0.79 ALDH1A1 (0.36) DPP8DPP9ALDH1A1SCN9A
SCHEMBL10040435 0.79 ALDH1A1 (0.36) ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9250519-B2 Pattern forming method and actinic ray-sensitive or radiation-sensitive resin composition for use in the method FUJIFILM CORPORATION (JP) 2016-02-02 US disclosed
US-20150111135-A1 PATTERN FORMING METHOD AND ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION FOR USE IN THE METHOD FUJIFILM CORPORATION (JP) 2015-04-23 US disclosed
US-8440386-B2 Patterning process, resist composition, and acetal compound SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-05-14 US disclosed
US-20120288796-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-11-15 US disclosed
US-20120009527-A1 PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-01-12 US disclosed
US-20110236826-A1 PATTERNING PROCESS, RESIST COMPOSITION, AND ACETAL COMPOUND SHIN-ETSU CHEMICAL CO., LTD. (JP) 2011-09-29 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20110236826-A1 PATTERNING PROCESS, RESIST COMPOSITION, AND ACETAL COMPOUND PARG, RAD51, CD38 DPP8 4872/4885DPP9 4799/4885ALDH1A1 549/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.