SCHEMBL10064074

SCHEMBL10064074

C=C(C)C(=O)OCc1ccc2c(c1)CC(=O)O2

nearest known ligand 0.44

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
CYP3A4 P08684 1/20 0.44
MAOA P21397 4/20 0.41
MAOB P27338 4/20 0.41
CA12 O43570 4/20 0.33
CA9 Q16790 4/20 0.33
ALDH1A1 P00352 3/20 0.33
HTT P42858 2/20 0.33
SMN1; SMN2 Q16637 2/20 0.33
CA2 P00918 3/20 0.33
PKM P14618 1/20 0.33
TSHR P16473 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10064073 0.90 CYP3A4 (0.44) CYP3A4MAOAMAOBALDH1A1HTT
SCHEMBL8009408 0.79 CYP3A4 (0.51) CYP3A4ALDH1A1HTTSMN1; SMN2CA2
SCHEMBL76684 0.77 MAOA (0.60) MAOAMAOBCA12CA9ALDH1A1
SCHEMBL8965716 0.76 CYP3A4 (0.76) CYP3A4ALDH1A1HTTSMN1; SMN2PKM
SCHEMBL254038 0.73 ALDH1A1 (0.50) CYP3A4ALDH1A1HTTTSHR
SCHEMBL12764440 0.73 CYP3A4 (0.58) CYP3A4ALDH1A1HTTSMN1; SMN2
SCHEMBL12764459 0.73 CYP3A4 (0.58) CYP3A4ALDH1A1HTTSMN1; SMN2
SCHEMBL14701268 0.73 CYP3A4 (0.36) CYP3A4ALDH1A1HTTCA2TSHR
SCHEMBL12764445 0.73 CYP3A4 (0.58) CYP3A4ALDH1A1HTTSMN1; SMN2
SCHEMBL12764450 0.73 CYP3A4 (0.58) CYP3A4ALDH1A1HTTSMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8623590-B2 Pattern forming process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-01-07 US disclosed
US-8623590-B2 Pattern forming process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-01-07 US disclosed
US-20120108043-A1 PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-05-03 US disclosed
US-20120108043-A1 PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-05-03 US disclosed