SCHEMBL14701268

SCHEMBL14701268

C=C(C)C(=O)OCc1ccc2c(c1)CC=C(O)C2

nearest known ligand 0.36

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
CYP3A4 P08684 1/20 0.36
NAAA Q02083 2/20 0.34
ALDH1A1 P00352 2/20 0.31
TSHR P16473 1/20 0.31
CA2 P00918 1/20 0.31
POLB P06746 1/20 0.31
APEX1 P27695 1/20 0.31
HTT P42858 1/20 0.31
TDP1 Q9NUW8 1/20 0.31
RXRB P28702 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14701269 0.82 NAAA (0.34) CYP3A4NAAARXRB
SCHEMBL16743390 0.78 NAAA (0.30) NAAA
SCHEMBL14947265 0.77 KMT2A (0.43) CYP3A4ALDH1A1CA2POLBAPEX1
SCHEMBL254038 0.74 ALDH1A1 (0.50) CYP3A4ALDH1A1TSHRPOLBAPEX1
SCHEMBL18904517 0.74 KDM4E (0.45) CYP3A4ALDH1A1TSHRCA2POLB
SCHEMBL1324374 0.74 CA2 (0.43) CYP3A4ALDH1A1TSHRCA2POLB
SCHEMBL92326 0.73 MEN1 (0.53) ALDH1A1TSHRCA2POLBAPEX1
SCHEMBL10064073 0.73 CYP3A4 (0.44) CYP3A4NAAAALDH1A1TSHRHTT
SCHEMBL10064074 0.73 CYP3A4 (0.44) CYP3A4ALDH1A1TSHRCA2HTT
SCHEMBL10322053 0.72 ALDH1A1 (0.48) CYP3A4ALDH1A1TSHRTDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9040225-B2 Developable bottom antireflective coating composition and pattern forming method using thereof INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2015-05-26 US disclosed
US-8999624-B2 Developable bottom antireflective coating composition and pattern forming method using thereof INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2015-04-07 US disclosed
US-20150050601-A1 DEVELOPABLE BOTTOM ANTIREFLECTIVE COATING COMPOSITION AND PATTERN FORMING METHOD USING THEREOF GLOBALFOUNDRIES U.S. INC. 2015-02-19 US disclosed
US-8715907-B2 Developable bottom antireflective coating compositions for negative resists INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2014-05-06 US disclosed
US-20130040238-A1 DEVELOPABLE BOTTOM ANTIREFLECTIVE COATING COMPOSITIONS FOR NEGATIVE RESISTS INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2013-02-14 US disclosed