SCHEMBL10077942

SCHEMBL10077942

CC(C)(C)CC(C(=O)OCc1cccc2c(O)cccc12)C(C)(C)C

nearest known ligand 0.35

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ CYBB P04839 1/20 0.34
▸ EGFR P00533 2/20 0.34
▸ CDC25B P30305 2/20 0.34
▸ IAPP P10997 2/20 0.33
▸ CA12 O43570 1/20 0.33
▸ CA1 P00915 1/20 0.33
▸ CA2 P00918 1/20 0.33
▸ CA7 P43166 1/20 0.33
▸ CA9 Q16790 1/20 0.33
▸ CA14 Q9ULX7 1/20 0.33
▸ CDK2 P24941 1/20 0.33
▸ TACR1 P25103 1/20 0.32
▸ ESR1 P03372 4/20 0.32
▸ ESR2 Q92731 4/20 0.32
▸ MEN1 O00255 3/20 0.32
▸ KMT2A Q03164 3/20 0.32
▸ ADRB2 P07550 1/20 0.32
▸ ADRB1 P08588 1/20 0.32
▸ ADRB3 P13945 1/20 0.32
▸ JAK2 O60674 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10077943 0.92 EGFR (0.36) EGFRTACR1MAPTNPSR1
SCHEMBL24859837 0.86 MMP1 (0.34) TACR1MEN1KMT2AMAPT
SCHEMBL19264731 0.85 CYBB (0.35) CYBBEGFRCDC25BIAPPCA12
SCHEMBL12999208 0.80 ESR1 (0.47) CDC25BCA12CA1CA2CA7
SCHEMBL19558277 0.77 KDM4E (0.44) CYBBCDC25BCA12CA1CA2
SCHEMBL8737610 0.75 CDC25B (0.39) CYBBCDC25BIAPPCA12CA1
SCHEMBL12999210 0.75 ESR1 (0.40) CDC25BESR1ESR2MEN1KMT2A
SCHEMBL18671831 0.74 CDC25B (0.39) CYBBCDC25BIAPPCA12CA1
SCHEMBL15189314 0.74 CDC25B (0.39) CYBBCDC25BIAPPCA12CA1
SCHEMBL8738362 0.74 CDC25B (0.39) CYBBCDC25BIAPPCA12CA1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2412733-B1 Polymer, chemically amplified negative resist composition, and patterning process SHINETSU CHEMICAL CO (JP) 2016-03-23 — — EP disclosed
EP-2264525-B1 Chemically amplified positive photoresist composition and pattern forming process SHINETSU CHEMICAL CO (JP) 2012-09-05 — — EP disclosed
EP-2412733-A1 Polymer, chemically amplified negative resist composition, and patterning process Shin-Etsu Chemical Co., Ltd. (JP) 2012-02-01 — — EP disclosed
EP-2264525-A2 Chemically amplified positive photoresist composition and pattern forming process Shin-Etsu Chemical Co., Ltd. (JP) 2010-12-22 — — EP disclosed
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