SCHEMBL24859837

SCHEMBL24859837

CC(C)(C)CC(C(=O)OCc1cccc2c(Br)cccc12)C(C)(C)C

nearest known ligand 0.34

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ MMP1 P03956 1/20 0.34
▸ MMP2 P08253 1/20 0.34
▸ MMP9 P14780 1/20 0.34
▸ MMP12 P39900 1/20 0.34
▸ KMT2A Q03164 5/20 0.34
▸ MEN1 O00255 4/20 0.34
▸ MAPT P10636 2/20 0.33
▸ RAB9A P51151 2/20 0.33
▸ PKM P14618 2/20 0.33
▸ AAK1 Q2M2I8 1/20 0.33
▸ POLB P06746 1/20 0.33
▸ NPC1 O15118 1/20 0.32
▸ AHR P35869 1/20 0.32
▸ RIPK1 Q13546 1/20 0.32
▸ PRNP P04156 1/20 0.31
▸ ALDH1A1 P00352 1/20 0.31
▸ ADAM17 P78536 1/20 0.31
▸ LMNA P02545 1/20 0.31
▸ L3MBTL1 Q9Y468 1/20 0.31
▸ TSHR P16473 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10077942 0.86 CYBB (0.34) KMT2AMEN1MAPTTACR1
SCHEMBL10077943 0.81 EGFR (0.36) MAPTRAB9ANPC1L3MBTL1TACR1
SCHEMBL12419185 0.75 RIPK1 (0.45) MMP1MMP2MMP9MMP12KMT2A
SCHEMBL10069694 0.72 ALDH1A1 (0.51) KMT2AALDH1A1LMNAL3MBTL1
SCHEMBL19264731 0.71 CYBB (0.35) KMT2AMEN1TACR1
SCHEMBL19512637 0.70 CA2 (0.39) —
SCHEMBL12999202 0.69 MEN1 (0.46) KMT2AMEN1ALDH1A1LMNA
SCHEMBL24445580 0.68 ALDH1A1 (0.34) KMT2AMEN1RAB9APOLBALDH1A1
SCHEMBL5750598 0.67 ALDH1A1 (0.49) KMT2AMEN1MAPTRAB9APKM
SCHEMBL24445490 0.66 LMNA (0.33) KMT2AMEN1ALDH1A1LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11548844-B2 Monomer, polymer, negative resist composition, photomask blank, and resist pattern forming process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-01-10 — — US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11548844-B2 Monomer, polymer, negative resist composition, photomask blank, and resist pattern forming process PARG, PCNA, PLK2 MMP1 3768/4885MMP2 4121/4885MMP9 2193/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.

Send feedback