Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | EGFR | P00533 | 4/20 | 0.36 |
| ▸ | IDO1 | P14902 | 6/20 | 0.34 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.33 |
| ▸ | NPC1 | O15118 | 2/20 | 0.33 |
| ▸ | HTT | P42858 | 2/20 | 0.33 |
| ▸ | RAB9A | P51151 | 2/20 | 0.33 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.33 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.33 |
| ▸ | LDHA | P00338 | 1/20 | 0.33 |
| ▸ | TACR1 | P25103 | 1/20 | 0.32 |
| ▸ | NR3C1 | P04150 | 1/20 | 0.32 |
| ▸ | PGR | P06401 | 1/20 | 0.32 |
| ▸ | NR3C2 | P08235 | 1/20 | 0.32 |
| ▸ | MAPT | P10636 | 1/20 | 0.32 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10077942 | 0.92 | CYBB (0.34) | EGFRNPSR1TACR1MAPT | |
| SCHEMBL24859837 | 0.81 | MMP1 (0.34) | NPC1RAB9ATACR1MAPTL3MBTL1 | |
| SCHEMBL12999210 | 0.80 | ESR1 (0.40) | IDO1NPC1RAB9ANPSR1MAPT | |
| SCHEMBL18697317 | 0.78 | IDO1 (0.44) | IDO1KDM4ENPC1HTTRAB9A | |
| SCHEMBL19264731 | 0.77 | CYBB (0.35) | EGFRTACR1 | |
| SCHEMBL10069694 | 0.76 | ALDH1A1 (0.51) | L3MBTL1 | |
| SCHEMBL8737840 | 0.75 | IDO1 (0.41) | IDO1KDM4ENPC1HTTRAB9A | |
| SCHEMBL12999208 | 0.75 | ESR1 (0.47) | NPSR1MAPT | |
| SCHEMBL17901893 | 0.74 | IDO1 (0.37) | IDO1KDM4ENPC1HTTRAB9A | |
| SCHEMBL18671828 | 0.74 | IDO1 (0.40) | IDO1KDM4ENPC1HTTRAB9A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2412733-B1 | Polymer, chemically amplified negative resist composition, and patterning process | SHINETSU CHEMICAL CO (JP) | 2016-03-23 | — | — | EP | disclosed |
| EP-2264525-B1 | Chemically amplified positive photoresist composition and pattern forming process | SHINETSU CHEMICAL CO (JP) | 2012-09-05 | — | — | EP | disclosed |
| EP-2412733-A1 | Polymer, chemically amplified negative resist composition, and patterning process | Shin-Etsu Chemical Co., Ltd. (JP) | 2012-02-01 | — | — | EP | disclosed |
| EP-2264525-A2 | Chemically amplified positive photoresist composition and pattern forming process | Shin-Etsu Chemical Co., Ltd. (JP) | 2010-12-22 | — | — | EP | disclosed |