SCHEMBL10087750

SCHEMBL10087750

Cc1c([N+](=O)[O-])cc(C(=O)OCCC2CCCCC2)cc1[N+](=O)[O-]

nearest known ligand 0.46

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 1/20 0.46
THRB P10828 5/20 0.46
ALDH1A1 P00352 5/20 0.44
KMT2A Q03164 4/20 0.44
MEN1 O00255 2/20 0.44
MAPT P10636 2/20 0.44
HPGD P15428 1/20 0.42
PAX8 Q06710 1/20 0.42
LMNA P02545 3/20 0.41
PPARG P37231 2/20 0.41
POLB P06746 2/20 0.41
HTT P42858 1/20 0.41
L3MBTL1 Q9Y468 1/20 0.41
VDR P11473 1/20 0.40
SMN1; SMN2 Q16637 1/20 0.39
RAB9A P51151 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5454047 0.88 KMT2A (0.47) ESR1THRBALDH1A1KMT2AMEN1
SCHEMBL14883167 0.87 LMNA (0.52) THRBALDH1A1KMT2AMEN1MAPT
SCHEMBL12203453 0.84 THRB (0.42) ESR1THRBALDH1A1KMT2AMEN1
SCHEMBL5460685 0.84 THRB (0.46) ESR1THRBALDH1A1KMT2AMEN1
SCHEMBL5461904 0.83 THRB (0.45) ESR1THRBALDH1A1KMT2AMEN1
SCHEMBL5461899 0.83 THRB (0.45) ESR1THRBALDH1A1KMT2AMEN1
SCHEMBL12229202 0.83 THRB (0.41) ESR1THRBALDH1A1KMT2AMEN1
SCHEMBL12406562 0.82 THRB (0.41) ESR1THRBALDH1A1KMT2AMEN1
SCHEMBL14883130 0.81 ESR1 (0.43) ESR1ALDH1A1HTTSMN1; SMN2
SCHEMBL107374 0.80 L3MBTL1 (0.43) ESR1ALDH1A1KMT2AMEN1HTT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8927194-B2 Chemical amplified photoresist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2015-01-06 US disclosed
US-20130177851-A1 PHOTORESIST COMPOSITION SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2013-07-11 US disclosed
US-20130101940-A1 CHEMICAL AMPLIFIED PHOTORESIST COMPOSITION SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2013-04-25 US disclosed
US-8343708-B2 Positive resist composition and pattern forming method FUJIFILM CORPORATION (JP) 2013-01-01 US disclosed
US-20120034564-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD FUJIFILM CORPORATION (JP) 2012-02-09 US disclosed