Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | THRB | P10828 | 9/20 | 0.46 |
| ▸ | PAX8 | Q06710 | 1/20 | 0.42 |
| ▸ | MAPT | P10636 | 3/20 | 0.42 |
| ▸ | PPARG | P37231 | 2/20 | 0.42 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.42 |
| ▸ | POLB | P06746 | 2/20 | 0.42 |
| ▸ | MEN1 | O00255 | 1/20 | 0.42 |
| ▸ | LMNA | P02545 | 1/20 | 0.42 |
| ▸ | HTT | P42858 | 1/20 | 0.42 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.42 |
| ▸ | ESR1 | P03372 | 1/20 | 0.41 |
| ▸ | VDR | P11473 | 1/20 | 0.41 |
| ▸ | HPGD | P15428 | 3/20 | 0.38 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5461904 | 0.99 | THRB (0.45) | THRBPAX8MAPTPPARGKMT2A | |
| SCHEMBL5461899 | 0.90 | THRB (0.45) | THRBPAX8MAPTPPARGKMT2A | |
| SCHEMBL14543738 | 0.85 | THRB (0.57) | THRBPAX8MAPTPPARGKMT2A | |
| SCHEMBL10087750 | 0.84 | ESR1 (0.46) | THRBPAX8MAPTPPARGKMT2A | |
| SCHEMBL5454047 | 0.84 | KMT2A (0.47) | THRBPAX8MAPTPPARGKMT2A | |
| SCHEMBL6395603 | 0.82 | SCN9A (0.36) | THRB | |
| SCHEMBL12203453 | 0.81 | THRB (0.42) | THRBPAX8MAPTPPARGKMT2A | |
| SCHEMBL14543741 | 0.81 | ESR1 (0.39) | KMT2AMEN1L3MBTL1ESR1 | |
| SCHEMBL14543740 | 0.81 | SCN9A (0.40) | KMT2AL3MBTL1ESR1HPGDALDH1A1 | |
| SCHEMBL12229202 | 0.81 | THRB (0.41) | THRBPAX8MAPTPPARGKMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8927194-B2 | Chemical amplified photoresist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2015-01-06 | — | — | US | disclosed |
| US-8343708-B2 | Positive resist composition and pattern forming method | FUJIFILM CORPORATION (JP) | 2013-01-01 | — | — | US | disclosed |
| US-20120034564-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD | FUJIFILM CORPORATION (JP) | 2012-02-09 | — | — | US | disclosed |
| US-20070088131-A1 | Sulfonate and resist composition | TOISHI KOUJI | 2007-04-19 | — | — | US | disclosed |
| US-20070088131-A1 | Sulfonate and resist composition | TOISHI KOUJI | 2007-04-19 | — | — | US | disclosed |
| US-7205090-B2 | Chemical amplification type positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2007-04-17 | — | — | US | disclosed |
| US-7175963-B2 | Chemical amplification type positive resist composition and a resin therefor | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2007-02-13 | — | — | US | disclosed |
| US-6951706-B2 | Sulfonate and resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2005-10-04 | — | — | US | disclosed |
| US-20040152009-A1 | Sulfonate and resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED | 2004-08-05 | — | — | US | disclosed |