SCHEMBL10106091

SCHEMBL10106091

COC(=O)COc1ccc([I+]c2ccc(OCC(=O)OC)cc2)cc1

nearest known ligand 0.55

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
▸ PTGS2 P35354 2/20 0.55
▸ ALDH1A1 P00352 3/20 0.51
▸ CYP2C9 P11712 1/20 0.51
▸ CYP2C19 P33261 1/20 0.51
▸ GLA P06280 1/20 0.50
▸ MAPT P10636 1/20 0.50
▸ MEN1 O00255 2/20 0.49
▸ KMT2A Q03164 2/20 0.49
▸ POLB P06746 2/20 0.49
▸ L3MBTL1 Q9Y468 1/20 0.49
▸ HPGD P15428 1/20 0.48
▸ GAA P10253 2/20 0.47
▸ LMNA P02545 2/20 0.47
▸ PPARD Q03181 1/20 0.47
▸ SMN1; SMN2 Q16637 1/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12289042 0.89 PTGS2 (0.47) PTGS2ALDH1A1CYP2C9CYP2C19GLA
SCHEMBL2116437 0.88 PTGS2 (0.66) PTGS2ALDH1A1CYP2C9CYP2C19GLA
SCHEMBL12061812 0.82 GAA (0.66) PTGS2ALDH1A1CYP2C9CYP2C19MAPT
SCHEMBL17365269 0.82 PTGS2 (0.60) PTGS2ALDH1A1CYP2C9CYP2C19GLA
SCHEMBL13935133 0.81 PTGS2 (0.58) PTGS2ALDH1A1CYP2C9CYP2C19GLA
SCHEMBL10364396 0.81 PTGS2 (0.58) PTGS2ALDH1A1CYP2C9CYP2C19GLA
SCHEMBL7693991 0.81 PTGS2 (0.58) PTGS2ALDH1A1CYP2C9CYP2C19GLA
SCHEMBL197602 0.81 PTGS2 (0.58) PTGS2ALDH1A1CYP2C9CYP2C19GLA
SCHEMBL4264046 0.81 PTGS2 (0.58) PTGS2ALDH1A1CYP2C9CYP2C19GLA
SCHEMBL5111012 0.81 LMNA (0.69) PTGS2ALDH1A1CYP2C9CYP2C19MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8853290-B2 Photosensitive composition SANYO CHEMICAL INDUSTRIES, LTD. (JP) 2014-10-07 — — US disclosed
US-20140045966-A1 PHOTOSENSITIVE COMPOSITION. CURED ARTICLE, AND METHOD FOR PRODUCING ACTINICALLY CURED ARTICLE SANYO CHEMICAL INDUSTRIES, LTD. (JP) 2014-02-13 — — US disclosed
US-20120142806-A1 PHOTOSENSITIVE COMPOSITION SANYO CHEMICAL INDUSTRIES, LTD. (JP) 2012-06-07 — — US disclosed
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