⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL800241 | 0.85 | CYP4F2 (0.31) | — | |
| SCHEMBL854195 | 0.83 | — | — | |
| SCHEMBL12012936 | 0.81 | — | — | |
| SCHEMBL13060559 | 0.80 | — | — | |
| SCHEMBL10110084 | 0.80 | — | — | |
| SCHEMBL493762 | 0.73 | TSHR (0.35) | — | |
| SCHEMBL10189210 | 0.72 | CA1 (0.32) | — | |
| SCHEMBL10330486 | 0.71 | — | — | |
| SCHEMBL12599428 | 0.68 | CYP4F2 (0.33) | — | |
| SCHEMBL824329 | 0.67 | HTT (0.31) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8247161-B2 | Resist composition for immersion exposure, method of forming resist pattern, and fluorine-containing resin | TOKYO OHKA KOGYO CO., LTD. (JP) | 2012-08-21 | — | — | US | disclosed |
| US-8105747-B2 | Positive resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2012-01-31 | — | — | US | disclosed |
| US-20110111343-A1 | POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2011-05-12 | — | — | US | disclosed |
| US-20100143844-A1 | Resist composition for immersion exposure, method of forming resist pattern, and fluorine-containing resin | TOKYO OHKA KOGYO CO., LTD. (JP) | 2010-06-10 | — | — | US | disclosed |
| US-20100075249-A1 | POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2010-03-25 | — | — | US | disclosed |
| US-20100069590-A1 | COMPOUND AND POLYMERIC COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2010-03-18 | — | — | US | disclosed |