⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL800241 | 0.79 | CYP4F2 (0.31) | — | |
| SCHEMBL493762 | 0.75 | TSHR (0.35) | — | |
| SCHEMBL13060559 | 0.72 | — | — | |
| SCHEMBL10110091 | 0.71 | — | — | |
| SCHEMBL799997 | 0.68 | — | — | |
| SCHEMBL854195 | 0.68 | — | — | |
| SCHEMBL12012936 | 0.67 | — | — | |
| SCHEMBL10189210 | 0.67 | CA1 (0.32) | — | |
| SCHEMBL18700648 | 0.66 | ALDH1A1 (0.38) | — | |
| SCHEMBL12617791 | 0.66 | HTT (0.35) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8221956-B2 | Resist composition for immersion exposure, method of forming resist pattern, and flourine-containing polymeric compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2012-07-17 | — | — | US | disclosed |
| US-20090317743-A1 | Resist composition for immersion exposure, method of forming resist pattern, and flourine-containing polymeric compound | TOKYO OHKA KOGYO CO., LTD. | 2009-12-24 | — | — | US | disclosed |