SCHEMBL10115547

SCHEMBL10115547

CC(F)(F)C(F)(F)C(F)(F)S(=O)(=O)N1CCCCCC1

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CA1 P00915 2/20 0.39
CA2 P00918 2/20 0.39
POLB P06746 2/20 0.39
TSHR P16473 6/20 0.38
KMT2A Q03164 2/20 0.38
GAA P10253 2/20 0.37
LMNA P02545 1/20 0.37
ALDH1A1 P00352 3/20 0.36
L3MBTL1 Q9Y468 2/20 0.36
MEN1 O00255 1/20 0.36
ATM Q13315 1/20 0.36
CYP3A4 P08684 1/20 0.35
CYP2C9 P11712 1/20 0.35
CYP2C19 P33261 1/20 0.35
PDK1 Q15118 2/20 0.33
PDK2 Q15119 2/20 0.33
PDK3 Q15120 2/20 0.33
PDK4 Q16654 2/20 0.33
KDM4E B2RXH2 2/20 0.33
ABCC9 O60706 2/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL110636 1.00 CA1 (0.39) CA1CA2POLBTSHRKMT2A
SCHEMBL112067 1.00 CA1 (0.39) CA1CA2POLBTSHRKMT2A
SCHEMBL12452705 0.98 CA1 (0.36) CA1CA2POLBTSHRKMT2A
SCHEMBL12452745 0.94 CA1 (0.38) CA1CA2POLBTSHRKMT2A
SCHEMBL12452725 0.94 CA1 (0.38) CA1CA2POLBTSHRKMT2A
SCHEMBL16687377 0.94 CA1 (0.38) CA1CA2POLBTSHRKMT2A
SCHEMBL12452794 0.92 CA1 (0.37) CA1CA2POLBTSHRKMT2A
SCHEMBL12452740 0.92 CA1 (0.34) CA1CA2POLBTSHRKMT2A
SCHEMBL15203374 0.85 KDM4E (0.43) KMT2AGAAALDH1A1L3MBTL1MEN1
SCHEMBL12452754 0.84 CTSS (0.36) TSHRKMT2AMEN1CYP3A4CYP2C9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9709891-B2 Positive resist composition, resin used for the positive resist composition, compound used for synthesis of the resin and pattern forming method using the positive resist composition FUJIFILM CORPORATION (JP) 2017-07-18 US disclosed
US-20170059992-A1 RESIST PATTERN-FORMING METHOD AND CHEMICALLY AMPLIFIED RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2017-03-02 US disclosed
US-20150168838-A1 POSITIVE RESIST COMPOSITION, RESIN USED FOR THE POSITIVE RESIST COMPOSITION, COMPOUND USED FOR SYNTHESIS OF THE RESIN AND PATTERN FORMING METHOD USING THE POSITIVE RESIST COMPOSITION FUJIFILM CORPORATION (JP) 2015-06-18 US disclosed
US-9057952-B2 Positive resist composition and method of pattern formation with the same FUJIFILM CORPORATION (JP) 2015-06-16 US disclosed
US-9023579-B2 Actinic-ray- or radiation-sensitive resin composition, compound and method of forming pattern using the composition FUJIFILM CORPORATION (JP) 2015-05-05 US disclosed
US-8476001-B2 Pattern forming method FUJIFILM CORPORATION (JP) 2013-07-02 US disclosed
US-20120237874-A1 Actinic-Ray- or Radiation-Sensitive Resin Composition, Compound and Method of Forming Pattern Using the Composition FUJIFILM CORPORATION (JP) 2012-09-20 US disclosed
US-20120115085-A1 POSITIVE RESIST COMPOSITION AND METHOD OF PATTERN FORMATION WITH THE SAME FUJIFILM CORPORATION (JP) 2012-05-10 US disclosed
US-20110250543-A1 PATTERN FORMING METHOD FUJIFILM CORPORATION (JP) 2011-10-13 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20120237874-A1 Actinic-Ray- or Radiation-Sensitive Resin Composition, Compound and Method of Forming Pattern Using the Composition RER1, RXRA, XRN2 CA1 326/4885CA2 1664/4885POLB 487/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.