SCHEMBL1011995

SCHEMBL1011995

C=C(COCC)C(N)=O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Ether SCHEMBL8665518 0.93 ALOX15 (0.37)
SCHEMBL3980516 0.85 TDP1 (0.38)
SCHEMBL5068236 0.82 CES2 (0.36)
SCHEMBL2907949 0.81 THRB (0.38)
Ether SCHEMBL28002784 0.79 ALOX15 (0.37)
SCHEMBL295594 0.79 CES2 (0.47)
SCHEMBL632280 0.78
SCHEMBL24978678 0.77 TDP1 (0.35)
SCHEMBL20262201 0.77 THRB (0.44)
SCHEMBL21618437 0.77 CES2 (0.55)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 314 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20220119569-A1 Curable and Solvent Soluble Formulations and Methods of Making and Using Therof POLY6 TECHNOLOGIES, INC. 2022-04-21 US claimed
US-20220055024-A1 Supported Hydrotreating Catalysts Having Enhanced Activity KETJEN NETHERLANDS B.V. (NL) 2022-02-24 US claimed
US-20200062877-A1 Curable and Solvent Soluble Formulations and Methods of Making and Using Therof POLY6 TECHNOLOGIES, INC. 2020-02-27 US claimed
CN-105446080-B A kind of coating composition, its application and the substrate using it 深圳市容大感光科技股份有限公司 2019-11-08 CN claimed
WO-2018156766-A2 CURABLE AND SOLVENT SOLUBLE FORMULATIONS AND METHODS OF MAKING AND USING THEREOF POLY6 TECHNOLOGIES, INC. (US) 2018-08-30 WO claimed
CN-105732889-B A kind of photoresist and its synthetic method 深圳市容大感光科技股份有限公司 2017-09-15 CN claimed
CN-105777986-B A kind of photoresist and its synthetic method 深圳市容大感光科技股份有限公司 2017-09-12 CN claimed
CN-105778726-B The base material of coating composition, its application and the film layer formed including the coating 深圳市容大感光科技股份有限公司 2017-03-08 CN claimed
CN-103044629-B Preparation method of acrylamide cross-linked urea glyoxal resin wet strength agent LI DUAN 2014-12-17 CN claimed
EP-2185360-A1 MULTI-LAYER IMAGEABLE ELEMENT WITH IMPROVED PROPERTIES Eastman Kodak Company (US) 2010-05-19 EP claimed
WO-2009023103-A1 MULTI-LAYER IMAGEABLE ELEMENT WITH IMPROVED PROPERTIES EASTMAN KODAK COMPANY (US) 2009-02-19 WO claimed
EP-1606337-A1 ELECTRICALLY HEATABLE PRESSURE-SENSITIVE ADHESIVE COMPOUND Tesa AG (DE) 2005-12-21 EP claimed
WO-2004081095-A1 ELECTRICALLY HEATABLE PRESSURE-SENSITIVE ADHESIVE COMPOUND TESA AG (DE) 2004-09-23 WO claimed
JP-8194111-A None JP disclosed
US-12509604-B2 Photocurable aqueous ink composition for inkjet printing SAKATA INX CORPORATION (JP) 2025-12-30 US disclosed
CN-115151618-B Adhesive sheet for bonding transparent members and laminate 王子控股株式会社 2024-12-20 CN disclosed
US-4289674-A COATINGS FOR INTERIORS OF BEER CANS PPG INDUSTRIES, INC. (US) 1981-09-15 US disclosed
US-4245059-A GOOD ADHESION TO COATINGS, SUSCEPTIBLE TO DECORATIVE FINISHES MITSUBISHI RAYON CO., LTD. (JP) 1981-01-13 US disclosed
US-4153778-A POLYOXYBUTYLENE GLYCOL OR POLYCAPROLACTONE CAPPED WITH A DIISOCYANATE, A DI- OR TRI-METHYLOL CARBOXYLIC ACID, AND A HYDROXY-ALKYL ACR UNION CARBIDE CORPORATION (US) 1979-05-08 US disclosed
US-3997627-A Polyester molding compositions containing hydroxy containing vinyl monomers and coated molded articles thereof MITSUBISHI RAYON CO., LTD. (JA) 1976-12-14 US disclosed