Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | RIPK1 | Q13546 | 4/20 | 0.34 |
| ▸ | PPARA | Q07869 | 4/20 | 0.32 |
| ▸ | PPARG | P37231 | 2/20 | 0.32 |
| ▸ | TSHR | P16473 | 2/20 | 0.32 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.32 |
| ▸ | CYP2D6 | P10635 | 2/20 | 0.31 |
| ▸ | CYP2C19 | P33261 | 2/20 | 0.31 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.31 |
| ▸ | MEN1 | O00255 | 1/20 | 0.31 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.31 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.31 |
| ▸ | MAPT | P10636 | 1/20 | 0.31 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.31 |
| ▸ | TET2 | Q6N021 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL24532122 | 0.83 | ELANE (0.42) | PPARAPPARGALDH1A1MEN1KMT2A | |
| SCHEMBL47393 | 0.81 | ALDH1A1 (0.38) | TSHRALDH1A1 | |
| SCHEMBL16866388 | 0.80 | DGAT1 (0.40) | RIPK1ALDH1A1KMT2A | |
| SCHEMBL9064823 | 0.80 | TSHR (0.36) | PPARAPPARGTSHRALDH1A1CYP2D6 | |
| SCHEMBL25800691 | 0.78 | GAA (0.30) | — | |
| SCHEMBL47394 | 0.78 | DGAT1 (0.46) | RIPK1ALDH1A1MEN1KMT2A | |
| SCHEMBL2740758 | 0.76 | CYP4F2 (0.31) | — | |
| SCHEMBL15033904 | 0.76 | CYP4F2 (0.31) | — | |
| SCHEMBL132096 | 0.76 | CYP1A2 (0.33) | CYP2D6CYP2C19CYP1A2 | |
| SCHEMBL23293010 | 0.75 | TSHR (0.38) | PPARAPPARGTSHRALDH1A1CYP2D6 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230002530-A1 | THERMOSETTING RESIN COMPOSITION, CURED FILM, METHOD FOR FORMING MULTILAYER COATING FILM, ESTER COMPOUND, AND POLYMER | KYOEISHA CHEMICAL CO., LTD. (JP) | 2023-01-05 | — | — | US | disclosed |
| US-8252508-B2 | Positive photosensitive composition and method of forming resist pattern | FUJIFILM CORPORATION (JP) | 2012-08-28 | — | — | US | disclosed |
| US-8206886-B2 | Photosensitive composition and pattern-forming method using the photosensitive composition | FUJIFILM CORPORATION (JP) | 2012-06-26 | — | — | US | disclosed |
| US-8039200-B2 | Photosensitive composition and pattern-forming method using the photosensitive composition | FUJIFILM CORPORATION (JP) | 2011-10-18 | — | — | US | disclosed |
| US-7867697-B2 | Positive photosensitive composition and method of forming resist pattern | FUJIFILM CORPORATION (JP) | 2011-01-11 | — | — | US | disclosed |
| US-20100304300-A1 | PHOTOSENSITIVE COMPOSITION AND PATTERN-FORMING METHOD USING THE PHOTOSENSITIVE COMPOSITION | FUJIFILM CORPORATION (JP) | 2010-12-02 | — | — | US | disclosed |
| US-20100261117-A1 | POSITIVE PHOTOSENSITIVE COMPOSITION AND METHOD OF FORMING RESIST PATTERN | FUJIFILM CORPORATION (JP) | 2010-10-14 | — | — | US | disclosed |
| US-7449573-B2 | Photosensitive composition, compound for use in the photosensitive composition, and method of pattern formation with the photosensitive composition | FUJIFILM CORPORATION (JP) | 2008-11-11 | — | — | US | disclosed |
| US-7323286-B2 | Photosensitive composition, compound used in the same, and patterning method using the same | FUJIFILM CORPORATION (JP) | 2008-01-29 | — | — | US | disclosed |