SCHEMBL10167783

SCHEMBL10167783

OCCCCCCc1ccc(-[s+]2c3ccccc3c3ccccc32)cc1

nearest known ligand 0.41

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
CA2 P00918 2/20 0.41
BCHE P06276 5/20 0.38
LTA4H P09960 1/20 0.37
EPHX2 P34913 1/20 0.37
CYP4F2 P78329 1/20 0.37
CYP4A11 Q02928 1/20 0.37
MAPT P10636 1/20 0.35
RXFP1 Q9HBX9 1/20 0.35
HDAC1 Q13547 4/20 0.35
HDAC2 Q92769 2/20 0.35
ALOX5 P09917 1/20 0.35
ACHE P22303 2/20 0.35
TDP1 Q9NUW8 1/20 0.34
MAOB P27338 1/20 0.34
IGF1R P08069 1/20 0.34
ALOX15 P16050 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2611737 1.00 CA2 (0.41) CA2BCHELTA4HEPHX2CYP4F2
SCHEMBL682975 0.86 TDP1 (0.48) CA2LTA4HEPHX2CYP4F2CYP4A11
Iodide SCHEMBL546036 0.85 TDP1 (0.47) CA2LTA4HEPHX2CYP4F2CYP4A11
SCHEMBL10167772 0.82 TDP1 (0.44) CA2MAPTHDAC1HDAC2ALOX5
SCHEMBL3434759 0.79 TSHR (0.44) CA2LTA4HMAOB
Acetic Acid SCHEMBL3775709 0.77 TSHR (0.39) CA2CYP4F2CYP4A11HDAC1HDAC2
SCHEMBL2451442 0.76 CA2 (0.46) CA2BCHELTA4HEPHX2CYP4F2
SCHEMBL23837668 0.74 CA2 (0.63) CA2BCHELTA4HEPHX2CYP4F2
SCHEMBL3424786 0.74 CA2 (0.63) CA2BCHELTA4HEPHX2CYP4F2
SCHEMBL4195590 0.74 CA2 (0.63) CA2BCHELTA4HEPHX2CYP4F2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8110333-B2 Resist composition containing novel sulfonium compound, pattern-forming method using the resist composition, and novel sulfonium compound FUJIFILM CORPORATION (JP) 2012-02-07 US disclosed
US-7858289-B2 Positive resist composition for electron beam, X-ray or EUV and pattern forming method using the same FUJIFILM CORPORATION (JP) 2010-12-28 US disclosed
US-20090111047-A1 POSITIVE RESIST COMPOSITION FOR ELECTRON BEAM, X-RAY OR EUV AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2009-04-30 US disclosed
US-20090042124-A1 RESIST COMPOSITION CONTAINING NOVEL SULFONIUM COMPOUND, PATTERN-FORMING METHOD USING THE RESIST COMPOSITION, AND NOVEL SULFONIUM COMPOUND FUJIFILM CORPORATION (JP) 2009-02-12 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20090042124-A1 RESIST COMPOSITION CONTAINING NOVEL SULFONIUM COMPOUND, PATTERN-FORMING METHOD USING THE RESIST COMPOSITION, AND NOVEL SULFONIUM COMPOUND ADH5, SRRM2, ADH1A CA2 3080/4885BCHE 4601/4885LTA4H 4809/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.