SCHEMBL10178461

SCHEMBL10178461

CCC(C)c1ccc(COc2ccc(C(=O)Oc3ccccc3)cc2)cc1

nearest known ligand 0.55

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
RXRA P19793 2/20 0.55
RXRB P28702 2/20 0.55
RAB9A P51151 3/20 0.55
NPC1 O15118 2/20 0.55
L3MBTL1 Q9Y468 2/20 0.53
HSP90AA1 P07900 1/20 0.53
ALDH1A1 P00352 3/20 0.52
TSHR P16473 1/20 0.52
SMN1; SMN2 Q16637 3/20 0.50
HTT P42858 2/20 0.50
ALOX5 P09917 2/20 0.50
MAOB P27338 1/20 0.50
GAA P10253 1/20 0.50
MAPT P10636 1/20 0.50
MEN1 O00255 1/20 0.49
KMT2A Q03164 1/20 0.49
BCHE P06276 1/20 0.49
NR4A1 P22736 1/20 0.49
NR4A2 P43354 1/20 0.49
NR4A3 Q92570 1/20 0.49

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13144362 0.90 ALDH1A1 (0.55) RAB9ANPC1L3MBTL1ALDH1A1TSHR
SCHEMBL1789851 0.88 ALDH1A1 (0.53) RAB9ANPC1L3MBTL1ALDH1A1TSHR
SCHEMBL10178734 0.87 MRGPRX4 (0.51) RXRARXRBRAB9ASMN1; SMN2ALOX5
SCHEMBL10178585 0.86 ALDH1A1 (0.67) RXRARXRBRAB9ANPC1L3MBTL1
SCHEMBL13144241 0.86 ALDH1A1 (0.51) L3MBTL1ALDH1A1TSHRSMN1; SMN2MAPT
SCHEMBL6721979 0.86 ALDH1A1 (0.56) RAB9ANPC1L3MBTL1HSP90AA1ALDH1A1
SCHEMBL9574763 0.85 NR4A1 (0.65) RXRARXRBRAB9ANPC1L3MBTL1
SCHEMBL26038937 0.84 ALDH1A1 (0.64) RXRARXRBRAB9ANPC1L3MBTL1
SCHEMBL6722051 0.84 BCHE (0.56) RXRARXRBRAB9ANPC1L3MBTL1
SCHEMBL10178689 0.84 TSHR (0.44) RAB9ANPC1L3MBTL1HSP90AA1ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8124310-B2 Positive resist composition and pattern forming method using the same FUJIFILM CORPORATION (JP) 2012-02-28 US disclosed
US-20090087784-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2009-04-02 US disclosed