Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.53 |
| ▸ | TSHR | P16473 | 1/20 | 0.53 |
| ▸ | MAPT | P10636 | 5/20 | 0.49 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.49 |
| ▸ | PARP10 | Q53GL7 | 1/20 | 0.49 |
| ▸ | PRSS1 | P07477 | 2/20 | 0.48 |
| ▸ | ACR | P10323 | 2/20 | 0.48 |
| ▸ | TMPRSS15 | P98073 | 2/20 | 0.48 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.46 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.46 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.46 |
| ▸ | PKM | P14618 | 1/20 | 0.46 |
| ▸ | NSD2 | O96028 | 1/20 | 0.45 |
| ▸ | MEN1 | O00255 | 2/20 | 0.44 |
| ▸ | ESR1 | P03372 | 1/20 | 0.44 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.44 |
| ▸ | THRB | P10828 | 1/20 | 0.44 |
| ▸ | HPGD | P15428 | 1/20 | 0.44 |
| ▸ | SLC6A2 | P23975 | 1/20 | 0.43 |
| ▸ | SLC6A4 | P31645 | 1/20 | 0.43 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13144362 | 0.98 | ALDH1A1 (0.55) | ALDH1A1TSHRMAPTSMN1; SMN2PARP10 | |
| SCHEMBL13144241 | 0.94 | ALDH1A1 (0.51) | ALDH1A1TSHRMAPTSMN1; SMN2PARP10 | |
| SCHEMBL6721979 | 0.94 | ALDH1A1 (0.56) | ALDH1A1TSHRMAPTPARP10PRSS1 | |
| SCHEMBL6722062 | 0.91 | ALDH1A1 (0.51) | ALDH1A1TSHRMAPTSMN1; SMN2PARP10 | |
| SCHEMBL13144206 | 0.91 | ALDH1A1 (0.51) | ALDH1A1TSHRMAPTSMN1; SMN2PARP10 | |
| SCHEMBL13144217 | 0.91 | ELANE (0.56) | ALDH1A1TSHRMAPTPARP10PRSS1 | |
| SCHEMBL10178689 | 0.89 | TSHR (0.44) | ALDH1A1TSHRMAPTSMN1; SMN2PARP10 | |
| SCHEMBL10178461 | 0.88 | RXRA (0.55) | ALDH1A1TSHRMAPTSMN1; SMN2KMT2A | |
| SCHEMBL2740713 | 0.88 | ALDH1A1 (0.48) | ALDH1A1TSHRMAPTSMN1; SMN2PARP10 | |
| SCHEMBL682241 | 0.88 | ALDH1A1 (0.48) | ALDH1A1TSHRMAPTSMN1; SMN2PARP10 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 32 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2249426-B1 | NONAQUEOUS ELECTROLYTE SOLUTION AND NONAQUEOUS ELECTROLYTE BATTERY | MITSUBISHI CHEM CORP (JP) | 2019-07-10 | — | — | EP | disclosed |
| US-9612535-B2 | Pattern forming method, electron beam- or extreme ultraviolet-sensitive resin composition, resist film using the same, method of manufacturing electronic device, and electronic device | FUJIFILM CORPORATION (JP) | 2017-04-04 | — | — | US | disclosed |
| CN-105762402-A | Nonaqueous electrolyte solution and nonaqueous electrolyte battery | 三菱化学株式会社 | 2016-07-13 | — | — | CN | disclosed |
| US-9323150-B2 | Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film therefrom and method of forming pattern | FUJIFILM CORPORATION (JP) | 2016-04-26 | — | — | US | disclosed |
| US-20150370170-A1 | PATTERN FORMING METHOD, ELECTRON BEAM- OR EXTREME ULTRAVIOLET-SENSITIVE RESIN COMPOSITION, RESIST FILM USING THE SAME, METHOD OF MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2015-12-24 | — | — | US | disclosed |
| US-9188862-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, and, actinic ray-sensitive or radiation-sensitive film and pattern forming method, each using the same | FUJIFILM CORPORATION (JP) | 2015-11-17 | — | — | US | disclosed |
| CN-103078137-B | Nonaqueous electrolyte solution and nonaqueous electrolyte battery | MITSUBISHI CHEMICAL CORP. (JP) | 2015-09-16 | — | — | CN | disclosed |
| US-9083058-B2 | Nonaqueous electrolytic solution and nonaqueous-electrolyte battery | MITSUBISHI CHEMICAL CORPORATION (JP) | 2015-07-14 | — | — | US | disclosed |
| US-9034558-B2 | Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film and method of forming pattern | FUJIFILM CORPORATION (JP) | 2015-05-19 | — | — | US | disclosed |
| CN-104600360-A | NONAQUEOUS ELECTROLYTE SOLUTION AND NONAQUEOUS ELECTROLYTE BATTERY | MITSUBISHI CHEM CORP | 2015-05-06 | — | — | CN | disclosed |
| US-8182975-B2 | Positive resist composition and pattern forming method using the same | FUJIFILM CORPORATION (JP) | 2012-05-22 | — | — | US | disclosed |
| US-20110123871-A1 | NONAQUEOUS ELECTROLYTIC SOLUTION AND NONAQUEOUS-ELECTROLYTE BATTERY | MITSUBISHI CHEMCIAL (JP) | 2011-05-26 | — | — | US | disclosed |
| CN-101960662-A | Nonaqueous electrolyte solution and nonaqueous electrolyte battery | MITSUBISHI CHEM CORP | 2011-01-26 | — | — | CN | disclosed |
| EP-2249426-A1 | NONAQUEOUS ELECTROLYTE SOLUTION AND NONAQUEOUS ELECTROLYTE BATTERY | Mitsubishi Chemical Corporation (JP) | 2010-11-10 | — | — | EP | disclosed |
| US-7799506-B2 | Positive resist composition and pattern forming method using the same | FUJIFILM CORPORATION (JP) | 2010-09-21 | — | — | US | disclosed |
| US-20090087776-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2009-04-02 | — | — | US | disclosed |
| US-20080248419-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2008-10-09 | — | — | US | disclosed |
| EP-0760359-B1 | Method for preparing aromatic carbonate | MITSUBISHI GAS CHEMICAL CO (JP) | 1999-10-20 | — | — | EP | disclosed |
| US-5714627-A | REACTING A DIALKYL CARBONATE WITH AN AROMATIC CARBOXYLIC ACID ARYL ESTER IN THE PRESENCE OF A CATALYST | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 1998-02-03 | — | — | US | disclosed |
| EP-0760359-A1 | Method for preparing aromatic carbonate | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 1997-03-05 | — | — | EP | disclosed |