SCHEMBL10178734

SCHEMBL10178734

CCC(C)c1cccc(COc2ccc(C(=O)Oc3ccccc3)cc2)c1

nearest known ligand 0.51

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MRGPRX4 Q96LA9 4/20 0.51
TP53 P04637 2/20 0.48
PKM P14618 2/20 0.48
NFKB1 P19838 2/20 0.48
NFKB2 Q00653 2/20 0.48
RELA Q04206 2/20 0.48
SMN1; SMN2 Q16637 2/20 0.48
PTPRC P08575 1/20 0.48
PTPN1 P18031 1/20 0.48
MAOB P27338 2/20 0.47
FFAR1 O14842 1/20 0.46
NR4A2 P43354 2/20 0.46
NR4A1 P22736 1/20 0.46
NR4A3 Q92570 1/20 0.46
ALOX5 P09917 2/20 0.46
RXRA P19793 1/20 0.45
RXRB P28702 1/20 0.45
RXRG P48443 1/20 0.45
RAB9A P51151 1/20 0.45
RXFP1 Q9HBX9 1/20 0.45

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10178727 0.91 MAPT (0.45) MRGPRX4TP53PKMNFKB1NFKB2
SCHEMBL10178461 0.87 RXRA (0.55) SMN1; SMN2MAOBNR4A2NR4A1NR4A3
SCHEMBL10178740 0.87 MRGPRX4 (0.57) MRGPRX4TP53PKMNFKB1NFKB2
SCHEMBL10178653 0.85 BCHE (0.53) MRGPRX4SMN1; SMN2MAOBFFAR1ALOX5
SCHEMBL10178652 0.85 MAPT (0.41) SMN1; SMN2
SCHEMBL10178722 0.84 MAOB (0.64) MRGPRX4TP53PKMNFKB1NFKB2
SCHEMBL10178526 0.83 NPC1 (0.48) SMN1; SMN2ALOX5RAB9A
SCHEMBL10178751 0.83 FFAR1 (0.53) MRGPRX4MAOBFFAR1ALOX5BCHE
SCHEMBL12133492 0.81 KMT2A (0.49) BCHE
SCHEMBL1790126 0.81 MAPT (0.50) PKMSMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8124310-B2 Positive resist composition and pattern forming method using the same FUJIFILM CORPORATION (JP) 2012-02-28 US disclosed
US-20090087784-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2009-04-02 US disclosed