Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HRH3 | Q9Y5N1 | 5/20 | 0.59 |
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.56 |
| ▸ | HRH4 | Q9H3N8 | 1/20 | 0.53 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.52 |
| ▸ | NCF1 | P14598 | 1/20 | 0.51 |
| ▸ | MEN1 | O00255 | 1/20 | 0.51 |
| ▸ | GFER | P55789 | 1/20 | 0.51 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.51 |
| ▸ | MBTD1 | Q05BQ5 | 1/20 | 0.50 |
| ▸ | L3MBTL3 | Q96JM7 | 1/20 | 0.50 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.50 |
| ▸ | TSHR | P16473 | 1/20 | 0.49 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.49 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.49 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10178419 | 0.98 | HRH3 (0.62) | HRH3ALDH1A1HRH4KDM4ENCF1 | |
| SCHEMBL12017826 | 0.86 | LMNA (0.57) | HRH3ALDH1A1KDM4ENCF1 | |
| SCHEMBL10077424 | 0.85 | HRH3 (0.59) | HRH3ALDH1A1MEN1KMT2A | |
| SCHEMBL12017823 | 0.85 | SIGMAR1 (0.54) | HRH3ALDH1A1MEN1KMT2A | |
| SCHEMBL6227511 | 0.84 | HRH3 (0.57) | HRH3ALDH1A1HRH4KDM4ENCF1 | |
| SCHEMBL18538130 | 0.83 | HRH3 (0.57) | HRH3ALDH1A1MEN1KMT2A | |
| SCHEMBL18538137 | 0.83 | HRH3 (0.57) | HRH3ALDH1A1MEN1KMT2A | |
| SCHEMBL18538136 | 0.83 | CXCR4 (0.57) | HRH3ALDH1A1MEN1KMT2A | |
| SCHEMBL14274074 | 0.83 | CXCR4 (0.57) | HRH3ALDH1A1MEN1KMT2A | |
| SCHEMBL4547890 | 0.83 | HRH3 (0.65) | HRH3ALDH1A1HRH4KDM4ENCF1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8124310-B2 | Positive resist composition and pattern forming method using the same | FUJIFILM CORPORATION (JP) | 2012-02-28 | — | — | US | disclosed |
| US-20090087784-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2009-04-02 | — | — | US | disclosed |