Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALOX5 | P09917 | 2/20 | 0.50 |
| ▸ | NPC1 | O15118 | 3/20 | 0.43 |
| ▸ | RAB9A | P51151 | 2/20 | 0.43 |
| ▸ | BCHE | P06276 | 2/20 | 0.42 |
| ▸ | MAPT | P10636 | 1/20 | 0.42 |
| ▸ | HSP90AA1 | P07900 | 1/20 | 0.41 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.41 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.40 |
| ▸ | CYP26A1 | O43174 | 1/20 | 0.40 |
| ▸ | F2 | P00734 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14866949 | 0.91 | ALOX5 (0.61) | ALOX5NPC1RAB9ABCHEMAPT | |
| SCHEMBL10178636 | 0.89 | ALOX5 (0.55) | ALOX5NPC1RAB9ABCHEMAPT | |
| SCHEMBL14118572 | 0.82 | RAB9A (0.55) | ALOX5NPC1RAB9ABCHEHSP90AA1 | |
| SCHEMBL14461691 | 0.82 | ALOX5 (0.61) | ALOX5NPC1RAB9ABCHECYP3A4 | |
| SCHEMBL14866835 | 0.82 | SMN1; SMN2 (0.39) | ALOX5NPC1RAB9ABCHEMAPT | |
| SCHEMBL10178565 | 0.81 | ALOX5 (0.46) | ALOX5BCHECYP3A4F2 | |
| SCHEMBL14118385 | 0.81 | ALOX5 (0.41) | ALOX5NPC1RAB9A | |
| SCHEMBL14118326 | 0.80 | NPC1 (0.49) | ALOX5NPC1RAB9ABCHEMAPT | |
| SCHEMBL2806115 | 0.79 | ALOX5 (0.69) | ALOX5NPC1RAB9AMAPTCYP3A4 | |
| SCHEMBL14118645 | 0.79 | ALDH1A1 (0.46) | NPC1RAB9ABCHEHSP90AA1L3MBTL1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8124310-B2 | Positive resist composition and pattern forming method using the same | FUJIFILM CORPORATION (JP) | 2012-02-28 | — | — | US | disclosed |
| US-20090087784-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2009-04-02 | — | — | US | disclosed |