SCHEMBL10178618

SCHEMBL10178618

CCc1cc(C(C)CC)ccc1CSC

nearest known ligand 0.45

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 4/20 0.45
GAA P10253 4/20 0.45
ALOX15 P16050 2/20 0.45
USP2 O75604 1/20 0.45
PKM P14618 1/20 0.45
HPGD P15428 1/20 0.45
HSD17B10 Q99714 1/20 0.45
HDAC4 P56524 1/20 0.39
HDAC2 Q92769 1/20 0.39
HDAC8 Q9BY41 1/20 0.39
TSHR P16473 2/20 0.35
NPSR1 Q6W5P4 1/20 0.33
LMNA P02545 2/20 0.32
HTT P42858 1/20 0.32
CYP2C9 P11712 1/20 0.32
MEN1 O00255 1/20 0.32
TP53 P04637 1/20 0.32
MAPT P10636 1/20 0.32
MAPK1 P28482 1/20 0.32
KMT2A Q03164 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10180143 0.76 ALDH1A1 (0.41) ALDH1A1GAAALOX15USP2PKM
SCHEMBL16736815 0.73 GAA (0.58) ALDH1A1GAAALOX15USP2PKM
SCHEMBL10486224 0.73 ALDH1A1 (0.58) ALDH1A1GAAALOX15USP2PKM
SCHEMBL682798 0.73 GAA (0.62) ALDH1A1GAAALOX15USP2PKM
SCHEMBL13144249 0.72 ALDH1A1 (0.45) ALDH1A1GAAALOX15USP2PKM
SCHEMBL10178552 0.72 ALDH1A1 (0.43) ALDH1A1GAAALOX15USP2PKM
SCHEMBL18713658 0.71 ALDH1A1 (0.50) ALDH1A1GAAALOX15USP2PKM
SCHEMBL10178512 0.70 HDAC4 (0.47) ALDH1A1GAAALOX15USP2PKM
SCHEMBL7081445 0.69 LMNA (0.41) ALDH1A1GAAALOX15HPGDHDAC4
SCHEMBL11436873 0.69 ALOX15 (0.39) ALDH1A1GAAALOX15USP2PKM

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8124310-B2 Positive resist composition and pattern forming method using the same FUJIFILM CORPORATION (JP) 2012-02-28 US disclosed
US-20090087784-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2009-04-02 US disclosed