SCHEMBL10178652

SCHEMBL10178652

CCC(C)c1cccc(CC(=O)c2ccc(C(=O)Oc3ccccc3)cc2)c1

nearest known ligand 0.46

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
MAPT P10636 2/20 0.41
STS P08842 1/20 0.41
SMN1; SMN2 Q16637 1/20 0.41
HDAC4 P56524 1/20 0.39
HDAC2 Q92769 1/20 0.39
HDAC8 Q9BY41 1/20 0.39
PPARA Q07869 2/20 0.39
L3MBTL1 Q9Y468 1/20 0.39
TMPRSS15 P98073 2/20 0.39
ALDH1A1 P00352 2/20 0.38
SRD5A2 P31213 2/20 0.38
PARP10 Q53GL7 1/20 0.38
NSD2 O96028 1/20 0.38
PPARG P37231 1/20 0.38
HPGD P15428 1/20 0.38
PRSS1 P07477 1/20 0.38
ACR P10323 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10178526 0.89 NPC1 (0.48) MAPTSMN1; SMN2HDAC4HDAC2HDAC8
SCHEMBL13144211 0.87 STS (0.47) MAPTSTSPPARAL3MBTL1ALDH1A1
SCHEMBL10178689 0.87 TSHR (0.44) MAPTSTSSMN1; SMN2PPARAL3MBTL1
SCHEMBL10178655 0.86 HDAC4 (0.48) MAPTSTSSMN1; SMN2HDAC4HDAC2
SCHEMBL10178734 0.85 MRGPRX4 (0.51) SMN1; SMN2
SCHEMBL10178691 0.84 SRD5A2 (0.52) MAPTSMN1; SMN2HDAC4HDAC2HDAC8
SCHEMBL1790126 0.82 MAPT (0.50) MAPTSMN1; SMN2HDAC4HDAC2HDAC8
SCHEMBL12133492 0.82 KMT2A (0.49) MAPTHDAC4HDAC2HDAC8ALDH1A1
SCHEMBL1789851 0.81 ALDH1A1 (0.53) MAPTSMN1; SMN2L3MBTL1TMPRSS15ALDH1A1
SCHEMBL10178727 0.81 MAPT (0.45) MAPTSMN1; SMN2L3MBTL1ALDH1A1PARP10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8124310-B2 Positive resist composition and pattern forming method using the same FUJIFILM CORPORATION (JP) 2012-02-28 US disclosed
US-20090087784-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2009-04-02 US disclosed