SCHEMBL10178727

SCHEMBL10178727

CCC(C)c1cccc(COCCOc2ccc(C(=O)Oc3ccccc3)cc2)c1

nearest known ligand 0.45

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 1/20 0.45
RAB9A P51151 1/20 0.45
ALDH1A1 P00352 2/20 0.45
L3MBTL1 Q9Y468 2/20 0.43
LMNA P02545 1/20 0.43
MAPK1 P28482 1/20 0.43
TDP1 Q9NUW8 1/20 0.42
KMT2A Q03164 2/20 0.42
MEN1 O00255 1/20 0.42
TAAR1 Q96RJ0 1/20 0.42
MRGPRX4 Q96LA9 2/20 0.42
PLA2G4B P0C869 1/20 0.41
CHRM2 P08172 1/20 0.41
PKM P14618 2/20 0.40
FAAH O00519 1/20 0.40
KAT6A Q92794 1/20 0.39
TSHR P16473 1/20 0.39
SMN1; SMN2 Q16637 2/20 0.39
TP53 P04637 1/20 0.39
NFKB1 P19838 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10178734 0.91 MRGPRX4 (0.51) RAB9AMRGPRX4PKMSMN1; SMN2TP53
SCHEMBL10178729 0.89 L3MBTL1 (0.54) MAPTRAB9AALDH1A1L3MBTL1LMNA
SCHEMBL10178744 0.82 CHRNB2 (0.40)
SCHEMBL10178652 0.81 MAPT (0.41) MAPTALDH1A1L3MBTL1SMN1; SMN2PARP10
SCHEMBL10178526 0.79 NPC1 (0.48) MAPTRAB9AKMT2ASMN1; SMN2
SCHEMBL10178740 0.78 MRGPRX4 (0.57) MAPTRAB9AALDH1A1L3MBTL1LMNA
SCHEMBL10178461 0.78 RXRA (0.55) MAPTRAB9AALDH1A1L3MBTL1KMT2A
SCHEMBL12133492 0.77 KMT2A (0.49) MAPTALDH1A1TDP1KMT2AMEN1
SCHEMBL1790126 0.77 MAPT (0.50) MAPTALDH1A1L3MBTL1LMNAMAPK1
SCHEMBL13144362 0.77 ALDH1A1 (0.55) MAPTRAB9AALDH1A1L3MBTL1TDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8124310-B2 Positive resist composition and pattern forming method using the same FUJIFILM CORPORATION (JP) 2012-02-28 US disclosed
US-20090087784-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2009-04-02 US disclosed