Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | FFAR1 | O14842 | 6/20 | 0.48 |
| ▸ | BCHE | P06276 | 2/20 | 0.48 |
| ▸ | ADAMTS4 | O75173 | 6/20 | 0.47 |
| ▸ | MMP13 | P45452 | 6/20 | 0.47 |
| ▸ | AKR1B1 | P15121 | 1/20 | 0.47 |
| ▸ | FFAR4 | Q5NUL3 | 1/20 | 0.47 |
| ▸ | MRGPRX4 | Q96LA9 | 1/20 | 0.47 |
| ▸ | GSTP1 | P09211 | 2/20 | 0.47 |
| ▸ | ACACB | O00763 | 1/20 | 0.45 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10178653 | 0.91 | BCHE (0.53) | FFAR1BCHEMRGPRX4 | |
| SCHEMBL10178751 | 0.89 | FFAR1 (0.53) | FFAR1BCHEFFAR4MRGPRX4ACACB | |
| SCHEMBL10178744 | 0.89 | CHRNB2 (0.40) | FFAR1BCHEADAMTS4MMP13 | |
| SCHEMBL21563941 | 0.85 | BCHE (0.53) | FFAR1BCHE | |
| SCHEMBL14118337 | 0.84 | BCHE (0.55) | FFAR1BCHEGSTP1ACACB | |
| SCHEMBL6721888 | 0.84 | BCHE (0.55) | FFAR1BCHEGSTP1ACACB | |
| SCHEMBL10178740 | 0.83 | MRGPRX4 (0.57) | ADAMTS4MRGPRX4 | |
| SCHEMBL28346872 | 0.82 | BCHE (0.60) | BCHE | |
| SCHEMBL11922929 | 0.82 | BCHE (0.60) | BCHE | |
| SCHEMBL10179168 | 0.82 | BCHE (0.40) | FFAR1BCHE |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8124310-B2 | Positive resist composition and pattern forming method using the same | FUJIFILM CORPORATION (JP) | 2012-02-28 | — | — | US | disclosed |
| US-20090087784-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2009-04-02 | — | — | US | disclosed |