SCHEMBL10178740

SCHEMBL10178740

CCC(C)c1cccc(COc2ccc(C(=O)c3ccccc3)cc2)c1

nearest known ligand 0.57

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MRGPRX4 Q96LA9 5/20 0.57
SMN1; SMN2 Q16637 4/20 0.56
RAB9A P51151 3/20 0.56
ALDH1A1 P00352 2/20 0.56
HTT P42858 2/20 0.56
GAA P10253 1/20 0.56
MAPT P10636 1/20 0.56
SRD5A2 P31213 2/20 0.56
L3MBTL1 Q9Y468 2/20 0.55
TP53 P04637 2/20 0.54
PKM P14618 2/20 0.54
NFKB1 P19838 2/20 0.54
NFKB2 Q00653 2/20 0.54
RELA Q04206 2/20 0.54
PTPRC P08575 1/20 0.51
PTPN1 P18031 1/20 0.51
RXFP1 Q9HBX9 1/20 0.51
ADAMTS4 O75173 1/20 0.50
MAOB P27338 1/20 0.50
PPARG P37231 1/20 0.50

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10178729 0.90 L3MBTL1 (0.54) MRGPRX4SMN1; SMN2RAB9AALDH1A1HTT
SCHEMBL10178722 0.88 MAOB (0.64) MRGPRX4SMN1; SMN2ALDH1A1HTTL3MBTL1
SCHEMBL10178734 0.87 MRGPRX4 (0.51) MRGPRX4SMN1; SMN2RAB9ATP53PKM
SCHEMBL10178585 0.86 ALDH1A1 (0.67) SMN1; SMN2RAB9AALDH1A1HTTGAA
SCHEMBL10178653 0.86 BCHE (0.53) MRGPRX4SMN1; SMN2MAOB
SCHEMBL10178709 0.83 FFAR1 (0.48) MRGPRX4ADAMTS4
SCHEMBL10178751 0.83 FFAR1 (0.53) MRGPRX4MAOBPPARG
SCHEMBL14201846 0.80 PTGS1 (0.66) SMN1; SMN2RAB9AALDH1A1HTTMAPT
SCHEMBL21563941 0.80 BCHE (0.53) MAOB
SCHEMBL15613835 0.80 MAOB (0.54) MRGPRX4SMN1; SMN2RAB9AHTTMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8124310-B2 Positive resist composition and pattern forming method using the same FUJIFILM CORPORATION (JP) 2012-02-28 US disclosed
US-20090087784-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2009-04-02 US disclosed