Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CHRNB2 | P17787 | 1/20 | 0.40 |
| ▸ | CHRNB4 | P30926 | 1/20 | 0.40 |
| ▸ | CHRNA3 | P32297 | 1/20 | 0.40 |
| ▸ | CHRNA7 | P36544 | 1/20 | 0.40 |
| ▸ | CHRNA4 | P43681 | 1/20 | 0.40 |
| ▸ | FFAR1 | O14842 | 5/20 | 0.40 |
| ▸ | ADAMTS4 | O75173 | 5/20 | 0.39 |
| ▸ | MMP13 | P45452 | 5/20 | 0.39 |
| ▸ | LSS | P48449 | 1/20 | 0.39 |
| ▸ | LTA4H | P09960 | 1/20 | 0.39 |
| ▸ | BCHE | P06276 | 1/20 | 0.38 |
| ▸ | RARA | P10276 | 1/20 | 0.38 |
| ▸ | RARB | P10826 | 1/20 | 0.38 |
| ▸ | PTGER4 | P35408 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10178709 | 0.89 | FFAR1 (0.48) | FFAR1ADAMTS4MMP13BCHE | |
| SCHEMBL10178613 | 0.86 | NPC1 (0.46) | CHRNB2CHRNB4CHRNA3CHRNA7CHRNA4 | |
| SCHEMBL10178729 | 0.85 | L3MBTL1 (0.54) | BCHE | |
| SCHEMBL10180887 | 0.84 | KDM4E (0.37) | FFAR1BCHEPTGER4 | |
| SCHEMBL10178573 | 0.83 | KDM4E (0.48) | PTGER4 | |
| SCHEMBL10178727 | 0.82 | MAPT (0.45) | — | |
| SCHEMBL10178653 | 0.80 | BCHE (0.53) | FFAR1BCHE | |
| SCHEMBL10178628 | 0.80 | TSHR (0.50) | BCHE | |
| SCHEMBL9793384 | 0.79 | MAOB (0.48) | CHRNB2CHRNB4CHRNA3CHRNA7CHRNA4 | |
| SCHEMBL10178751 | 0.78 | FFAR1 (0.53) | FFAR1LTA4HBCHE |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8124310-B2 | Positive resist composition and pattern forming method using the same | FUJIFILM CORPORATION (JP) | 2012-02-28 | — | — | US | disclosed |
| US-20090087784-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2009-04-02 | — | — | US | disclosed |