Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | BCHE | P06276 | 3/20 | 0.53 |
| ▸ | MAOB | P27338 | 3/20 | 0.49 |
| ▸ | MRGPRX4 | Q96LA9 | 1/20 | 0.48 |
| ▸ | ALOX5 | P09917 | 2/20 | 0.47 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.47 |
| ▸ | MEN1 | O00255 | 1/20 | 0.47 |
| ▸ | F10 | P00742 | 1/20 | 0.47 |
| ▸ | FFAR1 | O14842 | 1/20 | 0.45 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.45 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10178751 | 0.94 | FFAR1 (0.53) | BCHEMAOBMRGPRX4ALOX5FFAR1 | |
| SCHEMBL10178709 | 0.91 | FFAR1 (0.48) | BCHEMRGPRX4FFAR1 | |
| SCHEMBL28346872 | 0.91 | BCHE (0.60) | BCHEMAOBALOX5KMT2AMEN1 | |
| SCHEMBL11922929 | 0.91 | BCHE (0.60) | BCHEMAOBALOX5KMT2AMEN1 | |
| SCHEMBL21563941 | 0.87 | BCHE (0.53) | BCHEMAOBALOX5FFAR1 | |
| SCHEMBL10178740 | 0.86 | MRGPRX4 (0.57) | MAOBMRGPRX4SMN1; SMN2 | |
| SCHEMBL12961031 | 0.85 | MRGPRX4 (0.58) | BCHEMAOBMRGPRX4ALOX5KMT2A | |
| SCHEMBL10178734 | 0.85 | MRGPRX4 (0.51) | BCHEMAOBMRGPRX4ALOX5FFAR1 | |
| SCHEMBL10178738 | 0.84 | ALOX5 (0.53) | BCHEMAOBMRGPRX4ALOX5SMN1; SMN2 | |
| SCHEMBL10178628 | 0.84 | TSHR (0.50) | BCHEALOX5 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8124310-B2 | Positive resist composition and pattern forming method using the same | FUJIFILM CORPORATION (JP) | 2012-02-28 | — | — | US | disclosed |
| US-20090087784-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2009-04-02 | — | — | US | disclosed |