Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | USP2 | O75604 | 1/20 | 0.39 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.39 |
| ▸ | GAA | P10253 | 1/20 | 0.39 |
| ▸ | PKM | P14618 | 1/20 | 0.39 |
| ▸ | HPGD | P15428 | 1/20 | 0.39 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.39 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.39 |
| ▸ | HDAC4 | P56524 | 1/20 | 0.33 |
| ▸ | HDAC2 | Q92769 | 1/20 | 0.33 |
| ▸ | HDAC8 | Q9BY41 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10178512 | 0.81 | HDAC4 (0.47) | USP2ALDH1A1GAAPKMHPGD | |
| SCHEMBL10178552 | 0.79 | ALDH1A1 (0.43) | USP2ALDH1A1GAAPKMHPGD | |
| SCHEMBL18459293 | 0.74 | ALDH1A1 (0.41) | USP2ALDH1A1GAAPKMHPGD | |
| SCHEMBL11686432 | 0.74 | ALDH1A1 (0.46) | USP2ALDH1A1GAAPKMHPGD | |
| SCHEMBL21374510 | 0.72 | TYR (0.30) | — | |
| SCHEMBL10178671 | 0.72 | USP2 (0.34) | USP2ALDH1A1GAAPKMHPGD | |
| SCHEMBL20614519 | 0.69 | TYR (0.32) | — | |
| SCHEMBL10178618 | 0.68 | ALDH1A1 (0.45) | USP2ALDH1A1GAAPKMHPGD | |
| SCHEMBL20385883 | 0.67 | NPC1 (0.42) | ALDH1A1HPGD | |
| SCHEMBL7790218 | 0.67 | ALDH1A1 (0.42) | USP2ALDH1A1GAAPKMHPGD |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8124310-B2 | Positive resist composition and pattern forming method using the same | FUJIFILM CORPORATION (JP) | 2012-02-28 | — | — | US | disclosed |
| US-20090087784-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2009-04-02 | — | — | US | disclosed |