SCHEMBL10179112

SCHEMBL10179112

CCC(C)c1cccc(COc2ccccc2-c2ccccc2)c1

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PTGER1 P34995 7/20 0.50
PTGER4 P35408 6/20 0.50
PTGER3 P43115 6/20 0.50
PTGER2 P43116 6/20 0.50
RXRA P19793 1/20 0.46
RXRB P28702 1/20 0.46
RXRG P48443 1/20 0.46
CFD P00746 3/20 0.46
TPSB2 P20231 3/20 0.46
F11 P03951 2/20 0.46
MAPT P10636 2/20 0.44
MAPK1 P28482 2/20 0.44
USP2 O75604 1/20 0.44
LMNA P02545 1/20 0.44
HTT P42858 1/20 0.44
KDM4E B2RXH2 1/20 0.43
PKM P14618 1/20 0.43
TDP1 Q9NUW8 1/20 0.42
L3MBTL1 Q9Y468 1/20 0.42
ADRB2 P07550 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10178573 0.89 KDM4E (0.48) PTGER1PTGER4PTGER3PTGER2MAPT
SCHEMBL10179168 0.88 BCHE (0.40) PTGER1PTGER4PTGER3PTGER2CFD
SCHEMBL10178454 0.85 RXRA (0.56) PTGER1PTGER4PTGER3PTGER2RXRA
SCHEMBL13739157 0.81 RXRA (0.59) PTGER1PTGER4PTGER3PTGER2RXRA
SCHEMBL10178709 0.81 FFAR1 (0.48) MRGPRX4FFAR1
SCHEMBL10178653 0.80 BCHE (0.53) MRGPRX4FFAR1
SCHEMBL10180887 0.80 KDM4E (0.37) PTGER1PTGER4PTGER3PTGER2CFD
SCHEMBL25094104 0.80 PTGER1 (0.59) PTGER1PTGER4PTGER3PTGER2RXRA
SCHEMBL10179164 0.79 KDM4E (0.40) PTGER1PTGER4PTGER3PTGER2RXRA
SCHEMBL3758784 0.78 PTGER1 (0.48) PTGER1PTGER4PTGER3PTGER2RXRA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8124310-B2 Positive resist composition and pattern forming method using the same FUJIFILM CORPORATION (JP) 2012-02-28 US disclosed
US-20090087784-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2009-04-02 US disclosed