SCHEMBL10179164

SCHEMBL10179164

CCC(C)c1ccc(C(C)C)c(COc2ccccc2-c2ccccc2)c1

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 3/20 0.40
PTPRC P08575 1/20 0.40
PKM P14618 1/20 0.40
PTGER1 P34995 2/20 0.40
PTGER4 P35408 2/20 0.40
PTGER3 P43115 2/20 0.40
PTGER2 P43116 2/20 0.40
MAPK1 P28482 2/20 0.39
USP2 O75604 1/20 0.39
LMNA P02545 1/20 0.39
MAPT P10636 1/20 0.39
HTT P42858 1/20 0.39
ADRB2 P07550 3/20 0.39
HTR7 P34969 1/20 0.38
RXRA P19793 1/20 0.38
RXRB P28702 1/20 0.38
RXRG P48443 1/20 0.38
MEN1 O00255 1/20 0.38
KMT2A Q03164 1/20 0.38
ADRA1D P25100 2/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10178454 0.79 RXRA (0.56) KDM4EPKMPTGER1PTGER4PTGER3
SCHEMBL10179112 0.79 PTGER1 (0.50) KDM4EPKMPTGER1PTGER4PTGER3
SCHEMBL14118411 0.73 ABCB11 (0.41) KDM4EPTPRCPKMMAPK1USP2
SCHEMBL14118566 0.73 ALDH1A1 (0.48) KDM4EPKMMAPK1USP2LMNA
SCHEMBL10178497 0.72 KDM4E (0.51) KDM4EPKMMAPK1LMNAADRB2
SCHEMBL10178573 0.71 KDM4E (0.48) KDM4EPKMPTGER1PTGER4PTGER3
SCHEMBL13741181 0.70 TP53 (0.56) KDM4EPTGER1PTGER4PTGER3PTGER2
SCHEMBL16382369 0.69 KDM4E (0.44) KDM4EPKMMAPK1USP2LMNA
SCHEMBL10785009 0.69 RXRA (0.52) PTGER1PTGER4PTGER3PTGER2MAPK1
SCHEMBL10180231 0.68 PTGER4 (0.48) PTGER4RAB9AMAOBFFAR1ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8124310-B2 Positive resist composition and pattern forming method using the same FUJIFILM CORPORATION (JP) 2012-02-28 US disclosed
US-20090087784-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2009-04-02 US disclosed