SCHEMBL10179200

SCHEMBL10179200

CCC(C)c1cccc(CSc2ccc(-c3ccccc3)cc2)c1

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SLC6A4 P31645 2/20 0.48
FFAR1 O14842 1/20 0.40
HAO1 Q9UJM8 1/20 0.39
HDAC4 P56524 1/20 0.39
HDAC2 Q92769 1/20 0.39
HDAC8 Q9BY41 1/20 0.39
PTGS2 P35354 2/20 0.39
MAOA P21397 2/20 0.38
MAOB P27338 2/20 0.38
CA12 O43570 1/20 0.37
CA1 P00915 1/20 0.37
CA2 P00918 1/20 0.37
CA9 Q16790 1/20 0.37
MEN1 O00255 1/20 0.36
CYP1A2 P05177 1/20 0.36
CYP3A4 P08684 1/20 0.36
CYP2D6 P10635 1/20 0.36
CYP2C9 P11712 1/20 0.36
CYP2C19 P33261 1/20 0.36
KMT2A Q03164 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10178662 0.91 SLC6A4 (0.49) SLC6A4HDAC4HDAC2HDAC8MAOA
SCHEMBL10179892 0.79 HDAC4 (0.45) SLC6A4HDAC4HDAC2HDAC8MAOA
SCHEMBL18092986 0.77 HDAC4 (0.51) HDAC4HDAC2HDAC8PTGS2USP2
SCHEMBL8729744 0.77 HDAC4 (0.51) HDAC4HDAC2HDAC8PTGS2USP2
SCHEMBL10178512 0.76 HDAC4 (0.47) HDAC4HDAC2HDAC8USP2ALDH1A1
SCHEMBL10178709 0.75 FFAR1 (0.48) FFAR1
SCHEMBL6076179 0.75 MAOA (0.60) SLC6A4HAO1MAOAMAOBMEN1
SCHEMBL10179749 0.74 SLC6A4 (0.53) SLC6A4MAOAMAOBMEN1KMT2A
SCHEMBL10178617 0.74 HDAC4 (0.46) HDAC4HDAC2HDAC8MEN1CYP1A2
SCHEMBL9656296 0.74 PTGS2 (0.48) HDAC4HDAC2HDAC8PTGS2USP2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8124310-B2 Positive resist composition and pattern forming method using the same FUJIFILM CORPORATION (JP) 2012-02-28 US disclosed
US-20090087784-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2009-04-02 US disclosed