Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PTGER4 | P35408 | 11/20 | 0.48 |
| ▸ | FFAR1 | O14842 | 3/20 | 0.44 |
| ▸ | NPC1 | O15118 | 2/20 | 0.43 |
| ▸ | RAB9A | P51151 | 2/20 | 0.43 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.43 |
| ▸ | TSHR | P16473 | 1/20 | 0.43 |
| ▸ | MAOB | P27338 | 1/20 | 0.41 |
| ▸ | ENPP3 | O14638 | 1/20 | 0.40 |
| ▸ | ENPP1 | P22413 | 1/20 | 0.40 |
| ▸ | ADAMTS4 | O75173 | 1/20 | 0.39 |
| ▸ | MMP13 | P45452 | 1/20 | 0.39 |
| ▸ | HSP90AA1 | P07900 | 1/20 | 0.39 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14118337 | 0.79 | BCHE (0.55) | FFAR1NPC1RAB9AALDH1A1TSHR | |
| SCHEMBL6721888 | 0.79 | BCHE (0.55) | FFAR1NPC1RAB9AALDH1A1TSHR | |
| SCHEMBL10178709 | 0.78 | FFAR1 (0.48) | FFAR1ADAMTS4MMP13 | |
| SCHEMBL825567 | 0.77 | ALDH1A1 (0.55) | FFAR1NPC1RAB9AALDH1A1TSHR | |
| SCHEMBL10178626 | 0.75 | ALDH1A1 (0.41) | NPC1RAB9AALDH1A1TSHRHSP90AA1 | |
| SCHEMBL825382 | 0.74 | TSHR (0.42) | ALDH1A1TSHR | |
| SCHEMBL14461757 | 0.74 | CCNB2 (0.50) | FFAR1TSHRMAOB | |
| SCHEMBL10178778 | 0.74 | ALDH1A1 (0.40) | FFAR1NPC1RAB9AALDH1A1TSHR | |
| SCHEMBL16687011 | 0.73 | GRIA4 (0.51) | ALDH1A1TSHR | |
| SCHEMBL3628638 | 0.73 | GRIA4 (0.51) | ALDH1A1TSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8124310-B2 | Positive resist composition and pattern forming method using the same | FUJIFILM CORPORATION (JP) | 2012-02-28 | — | — | US | disclosed |
| US-20090087784-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2009-04-02 | — | — | US | disclosed |