SCHEMBL10180393

SCHEMBL10180393

CCC(C)c1ccc(OS(=O)(=O)C(F)(F)C(F)(F)C(F)(F)S(=O)(=O)S(=O)(=O)O)cc1

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 5/20 0.42
TSHR P16473 2/20 0.42
CXCR2 P25025 2/20 0.39
CXCR1 P25024 1/20 0.38
MEN1 O00255 1/20 0.36
KMT2A Q03164 1/20 0.36
TDP1 Q9NUW8 1/20 0.36
MAPT P10636 2/20 0.36
GAA P10253 2/20 0.36
NPC1 O15118 2/20 0.35
RAB9A P51151 2/20 0.35
CASP1 P29466 1/20 0.34
HSP90AA1 P07900 1/20 0.34
L3MBTL1 Q9Y468 1/20 0.34
SLC7A5 Q01650 1/20 0.33
USP2 O75604 1/20 0.33
PKM P14618 1/20 0.33
HPGD P15428 1/20 0.33
ALOX15 P16050 1/20 0.33
HSD17B10 Q99714 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL682247 0.90 ALDH1A1 (0.43) ALDH1A1TSHRCXCR2CXCR1MEN1
SCHEMBL2740731 0.84 ALDH1A1 (0.46) ALDH1A1TSHRCXCR2CXCR1MEN1
SCHEMBL14667644 0.81 CXCR2 (0.38) ALDH1A1TSHRCXCR2CXCR1MEN1
SCHEMBL17175348 0.81 CXCR2 (0.38) ALDH1A1TSHRCXCR2CXCR1MEN1
SCHEMBL24226214 0.81 CXCR2 (0.38) ALDH1A1TSHRCXCR2CXCR1MEN1
SCHEMBL15831175 0.80 CXCR2 (0.38) ALDH1A1TSHRCXCR2CXCR1MEN1
SCHEMBL10183035 0.80 ABCB11 (0.41) ALDH1A1TSHRCXCR2CXCR1GAA
SCHEMBL683002 0.80 CXCR2 (0.40) ALDH1A1TSHRCXCR2CXCR1MEN1
SCHEMBL2740807 0.80 ALDH1A1 (0.47) ALDH1A1TSHRCXCR2CXCR1MEN1
SCHEMBL17598857 0.79 ALDH1A1 (0.46) ALDH1A1TSHRCXCR2CXCR1MEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8865389-B2 Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film therefrom and method of forming pattern FUJIFILM CORPORATION (JP) 2014-10-21 US disclosed
US-20120076997-A1 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM THEREFROM AND METHOD OF FORMING PATTERN FUJIFILM CORPORATION (JP) 2012-03-29 US disclosed