SCHEMBL10186558

SCHEMBL10186558

CC(C)(OC(=O)N1CCCCC1)c1ccccc1

nearest known ligand 0.51

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ SMN1; SMN2 Q16637 3/20 0.51
▸ NPC1 O15118 3/20 0.51
▸ RAB9A P51151 2/20 0.51
▸ MAPT P10636 1/20 0.51
▸ HTT P42858 1/20 0.51
▸ MEN1 O00255 4/20 0.49
▸ KMT2A Q03164 4/20 0.49
▸ NPSR1 Q6W5P4 2/20 0.49
▸ LMNA P02545 2/20 0.49
▸ HPGD P15428 3/20 0.46
▸ ALDH1A1 P00352 2/20 0.46
▸ POLB P06746 1/20 0.46
▸ CYP2B6 P20813 1/20 0.46
▸ GPR119 Q8TDV5 1/20 0.46
▸ GAA P10253 1/20 0.44
▸ ALOX15 P16050 1/20 0.43
▸ HSD11B1 P28845 1/20 0.43
▸ TP53 P04637 1/20 0.43
▸ CASP3 P42574 1/20 0.43
▸ SENP8 Q96LD8 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7786775 0.84 ALDH1A1 (0.46) SMN1; SMN2NPC1RAB9AMAPTHTT
SCHEMBL12551255 0.83 FAAH (0.43) SMN1; SMN2LMNAALDH1A1POLBGPR119
SCHEMBL25192823 0.79 SMN1; SMN2 (0.45) SMN1; SMN2NPC1RAB9AMAPTHTT
SCHEMBL15082572 0.78 NPSR1 (0.45) SMN1; SMN2NPC1RAB9AMAPTHTT
SCHEMBL770152 0.77 SMN1; SMN2 (0.48) SMN1; SMN2NPC1RAB9AMAPTHTT
SCHEMBL25191894 0.77 HPGD (0.45) SMN1; SMN2NPC1RAB9AMAPTMEN1
Iodide SCHEMBL7274891 0.75 GPR119 (0.50) SMN1; SMN2NPC1RAB9AMAPTHTT
SCHEMBL30998629 0.75 RORC (0.42) ALDH1A1GPR119ALOX15HSD11B1
Benzylamine SCHEMBL8028466 0.75 STS (0.51) SMN1; SMN2MEN1KMT2AHPGDGPR119
SCHEMBL12281697 0.75 NPSR1 (0.49) SMN1; SMN2NPC1RAB9AMAPTMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20120164573-A1 ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST FILM AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2012-06-28 — — US disclosed
US-20120164573-A1 ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST FILM AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2012-06-28 — — US disclosed
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