SCHEMBL10239135

SCHEMBL10239135

O=C(O)C1C2CCC(O2)C1C(=O)OCC(F)(F)S(=O)(=O)O

nearest known ligand 0.60

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PPM1B O75688 4/20 0.60
PTPN1 P18031 3/20 0.60
PPP1CC P36873 3/20 0.60
TFPI2 P48307 5/20 0.47
KDM4E B2RXH2 2/20 0.47
LMNA P02545 2/20 0.47
GMNN O75496 1/20 0.47
PMP22 Q01453 1/20 0.47
TP53 P04637 1/20 0.47
TSHR P16473 1/20 0.47
NFKB1 P19838 1/20 0.47
THPO P40225 1/20 0.47
MEN1 O00255 1/20 0.37
ALDH1A1 P00352 1/20 0.37
HTT P42858 1/20 0.37
KMT2A Q03164 1/20 0.37
L3MBTL1 Q9Y468 1/20 0.37
PPP1CA P62136 1/20 0.35
FABP7 O15540 1/20 0.35
PPP5C P53041 2/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10239131 0.88 PPM1B (0.51) PPM1BPTPN1PPP1CC
SCHEMBL10239141 0.83 PPM1B (0.41) PPM1BPTPN1PPP1CCFABP7
SCHEMBL10239139 0.80 PPM1B (0.39) PPM1BPTPN1PPP1CCMEN1ALDH1A1
SCHEMBL10239123 0.80 ALDH1A1 (0.37) PPM1BPTPN1PPP1CCLMNATSHR
SCHEMBL15250482 0.78 PPM1B (0.33) PPM1BPTPN1PPP1CCMEN1KMT2A
SCHEMBL18785904 0.77 L3MBTL1 (0.34) KDM4ELMNATP53TSHRMEN1
SCHEMBL15250485 0.77 PPM1B (0.30) PPM1BPTPN1PPP1CC
SCHEMBL14398380 0.76 PPM1B (1.00) PPM1BPTPN1PPP1CCTFPI2KDM4E
SCHEMBL18785916 0.75 ALDH1A1 (0.52) KDM4ELMNAALDH1A1HTTFABP7
SCHEMBL12016473 0.74 ALDH1A1 (0.40) TP53TSHRMEN1ALDH1A1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-RE46765-E1 Chemically amplified negative resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2018-03-27 US disclosed
US-RE46736-E1 Chemically amplified negative resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2018-02-27 US disclosed
US-8951710-B2 Chemically amplified negative resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-02-10 US disclosed
US-8951710-B2 Chemically amplified negative resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-02-10 US disclosed
US-20140342274-A1 CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-11-20 US disclosed
US-20140342274-A1 CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-11-20 US disclosed
US-8835096-B2 Chemically amplified negative resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-09-16 US disclosed
US-8835096-B2 Chemically amplified negative resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-09-16 US disclosed
US-20120219887-A1 CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-08-30 US disclosed
US-8114570-B2 Photoacid generator, resist composition, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-02-14 US disclosed
US-20090246694-A1 NOVEL PHOTOACID GENERATOR, RESIST COMPOSITION, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-10-01 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20090246694-A1 NOVEL PHOTOACID GENERATOR, RESIST COMPOSITION, AND PATTERNING PROCESS ASIC1, HAO2, HRH3 PPM1B 4455/4885PTPN1 4384/4885PPP1CC 4516/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.