SCHEMBL10247773

SCHEMBL10247773

CCC(C)(CO)[C@H](O)OC12CC3CC(CC(O)(C3)C1)C2

nearest known ligand 0.38

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
PKM P14618 1/20 0.32
HSD11B1 P28845 2/20 0.31
DPP4 P27487 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14492480 0.88 PKM (0.31) PKMHSD11B1
SCHEMBL10247948 0.88
SCHEMBL19036866 0.85 PKM (0.34) PKMHSD11B1DPP4
SCHEMBL10248040 0.85 PKM (0.34) PKMHSD11B1DPP4
SCHEMBL13344887 0.79 MDH1 (0.33) PKM
SCHEMBL14040478 0.73 PKM (0.32) PKM
SCHEMBL19880273 0.72 PKM (0.38) PKMHSD11B1DPP4
SCHEMBL10251599 0.71 PKM (0.35) PKMHSD11B1DPP4
SCHEMBL10254530 0.71 PKM (0.35) PKMHSD11B1DPP4
SCHEMBL13416367 0.71

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20120076996-A1 RESIST COMPOSITION, RESIST FILM THEREFROM AND METHOD OF FORMING PATTERN THEREWITH FUJIFILM CORPORATION (JP) 2012-03-29 US disclosed