SCHEMBL10247838

SCHEMBL10247838

CC(C)C(=O)N(C1CCCCC1)C1CC2CCC1C2

nearest known ligand 0.43

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
HPGD P15428 2/20 0.38
LMNA P02545 1/20 0.38
SMN1; SMN2 Q16637 1/20 0.38
KMT2A Q03164 2/20 0.36
MEN1 O00255 1/20 0.36
NPC1 O15118 1/20 0.36
RAB9A P51151 1/20 0.36
TSHR P16473 1/20 0.35
EPHX1 P07099 2/20 0.35
S1PR1 P21453 2/20 0.34
S1PR3 Q99500 2/20 0.34
LIPE Q05469 1/20 0.32
ADH1B P00325 1/20 0.31
ADH1C P00326 1/20 0.31
ADH1A P07327 1/20 0.31
DPP4 P27487 1/20 0.30
ALDH1A1 P00352 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10248089 0.78 TSHR (0.46) TSHRS1PR1S1PR3ADH1BADH1C
SCHEMBL12452633 0.78 HSD11B1 (0.39) HPGDLMNASMN1; SMN2KMT2AMEN1
SCHEMBL10247857 0.76 TSHR (0.43) TSHRS1PR1S1PR3ADH1BADH1C
SCHEMBL16687757 0.71 MEN1 (0.33) KMT2AMEN1NPC1RAB9AEPHX1
SCHEMBL10224960 0.70 MEN1 (0.30) KMT2AMEN1NPC1RAB9A
SCHEMBL3070385 0.69 POLB (0.37) HPGDLMNASMN1; SMN2KMT2AMEN1
SCHEMBL2278722 0.66 SLC6A2 (0.54)
SCHEMBL12308324 0.65 ADH1C (0.45) HPGDNPC1RAB9ATSHRLIPE
SCHEMBL17774457 0.65 ADH1B (0.41) TSHRADH1BADH1CADH1A
SCHEMBL17281560 0.64 TSHR (0.44) TSHRS1PR1S1PR3ADH1BADH1C

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8647812-B2 Pattern forming method, chemical amplification resist composition and resist film FUJIFILM CORPORATION (JP) 2014-02-11 US disclosed
US-20130011619-A1 PATTERN FORMING METHOD, CHEMICAL AMPLIFICATION RESIST COMPOSITION AND RESIST FILM FUJIFILM CORPORATION (JP) 2013-01-10 US disclosed
US-20120076996-A1 RESIST COMPOSITION, RESIST FILM THEREFROM AND METHOD OF FORMING PATTERN THEREWITH FUJIFILM CORPORATION (JP) 2012-03-29 US disclosed