⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL30381903 | 0.79 | — | — | |
| SCHEMBL1818086 | 0.78 | MLYCD (0.42) | — | |
| SCHEMBL321052 | 0.78 | — | — | |
| SCHEMBL27548042 | 0.77 | — | — | |
| SCHEMBL6115923 | 0.77 | ALDH1A1 (0.32) | — | |
| SCHEMBL1106444 | 0.76 | — | — | |
| SCHEMBL21488420 | 0.75 | — | — | |
| SCHEMBL28488909 | 0.75 | CHRM2 (0.41) | — | |
| SCHEMBL16944043 | 0.73 | ALDH1A1 (0.39) | — | |
| SCHEMBL23588465 | 0.73 | LMNA (0.33) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2021237121-A1 | SUBSTITUTED PYRIDINES | GOSSAMER BIO SERVICES, INC. (US) | 2021-11-25 | — | — | WO | disclosed |
| EP-2434343-B1 | Resist composition, resist film therefrom and method of forming pattern therewith | FUJIFILM CORP (JP) | 2019-05-15 | — | — | EP | disclosed |
| WO-2019016385-A1 | BENZAMIDE COMPOUNDS AND THEIR USE AS HERBICIDES | BASF SE (DE) | 2019-01-24 | — | — | WO | disclosed |
| EP-2885296-B1 | PROCESS FOR MANUFACTURING BENZOXAZINONES | BASF SE (DE) | 2016-06-29 | — | — | EP | disclosed |
| US-8647812-B2 | Pattern forming method, chemical amplification resist composition and resist film | FUJIFILM CORPORATION (JP) | 2014-02-11 | — | — | US | disclosed |
| US-20130011619-A1 | PATTERN FORMING METHOD, CHEMICAL AMPLIFICATION RESIST COMPOSITION AND RESIST FILM | FUJIFILM CORPORATION (JP) | 2013-01-10 | — | — | US | disclosed |
| US-20120308931-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2012-12-06 | — | — | US | disclosed |
| US-20120076996-A1 | RESIST COMPOSITION, RESIST FILM THEREFROM AND METHOD OF FORMING PATTERN THEREWITH | FUJIFILM CORPORATION (JP) | 2012-03-29 | — | — | US | disclosed |