SCHEMBL10276913

SCHEMBL10276913

COc1ccc(C(=O)C(OC(=O)NC2CCCCC2)c2ccc(OC)cc2)cc1

nearest known ligand 0.54

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
RAB9A P51151 7/20 0.54
NPC1 O15118 6/20 0.54
HTT P42858 2/20 0.53
MAPT P10636 4/20 0.53
MEN1 O00255 3/20 0.53
KMT2A Q03164 3/20 0.53
LMNA P02545 1/20 0.53
EPHX2 P34913 3/20 0.51
EPHX1 P07099 1/20 0.51
POLB P06746 1/20 0.50
SMN1; SMN2 Q16637 3/20 0.48
TSHR P16473 1/20 0.47
MAPK1 P28482 1/20 0.47
NPSR1 Q6W5P4 1/20 0.47
HPGD P15428 1/20 0.47

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13751772 0.92 MEN1 (0.53) RAB9ANPC1HTTMAPTMEN1
SCHEMBL15074523 0.86 RAB9A (0.48) RAB9ANPC1HTTMAPTMEN1
SCHEMBL17763406 0.83 MEN1 (0.60) RAB9ANPC1HTTMAPTMEN1
SCHEMBL771095 0.82 TSHR (0.59) RAB9ANPC1LMNAEPHX1TSHR
SCHEMBL21693864 0.79 RAB9A (0.52) RAB9ANPC1HTTMAPTMEN1
Nifedipine SCHEMBL20187258 0.78 ADORA3 (0.55) RAB9ANPC1HTTMAPTMEN1
SCHEMBL771096 0.78 RAB9A (0.54) RAB9ANPC1HTTMAPTMEN1
SCHEMBL11240479 0.76 RAB9A (0.76) RAB9ANPC1HTTMAPTMEN1
SCHEMBL31359577 0.74 MAPT (0.64) RAB9ANPC1MAPTMEN1KMT2A
SCHEMBL21693865 0.73 MAPT (0.60) RAB9ANPC1HTTMAPTMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 90 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240168374-A1 PHOTORESIST COMPOSITION TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) 2024-05-23 US claimed
US-11623975-B2 Molding material and method for producing resin molded body using same OSAKA UNIVERSITY (JP) 2023-04-11 US claimed
US-20260117026-A1 DIELECTRIC MATERIALS BASED ON HETEROAROMATIC-EXTENDED BISMALEIMIDES MERCK PATENT GMBH (DE) 2026-04-30 US disclosed
EP-4346935-B1 COATING FOR MEDICAL DEVICES SMART REACTORS SERVICE LTD (IE) 2026-04-22 EP disclosed
WO-2025083931-A1 METHOD FOR PRODUCING RESIN MEMBER 株式会社豊田自動織機 2025-04-24 WO disclosed
EP-4301804-B1 DIELECTRIC MATERIALS BASED ON AMIDE-IMIDE-EXTENDED BISMALEIMIDES MERCK PATENT GMBH (DE) 2024-12-04 EP disclosed
US-20240384332-A1 PROGRAMMABLE NUCLEASE DIAGNOSTIC DEVICE MAMMOTH BIOSCIENCES, INC. 2024-11-21 US disclosed
US-20240327810-A1 EFFECTOR PROTEINS AND METHODS OF USE MAMMOTH BIOSCIENCES, INC. 2024-10-03 US disclosed
US-20240294970-A1 METHODS AND COMPOSITIONS FOR PERFORMING A DETECTION ASSAY MAMMOTH BIOSCIENCES, INC. 2024-09-05 US disclosed
US-20240254262-A1 DIELECTRIC MATERIALS BASED ON OLIGOAMIDE-EXTENDED BISMALEIMIDES MERCK PATENT GMBH (DE) 2024-08-01 US disclosed
US-20240226395-A1 COATING FOR MEDICAL DEVICES Smart Reactors Service Limited (IE) 2024-07-11 US disclosed
US-8236476-B2 Multiple exposure photolithography methods and photoresist compositions INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2012-08-07 US disclosed
US-20120176456-A1 ULTRAVIOLET CROSSLINKING INK AND INKJET RECORDING METHOD RICOH COMPANY, LTD., (JP) 2012-07-12 US disclosed
US-20120178027-A1 MULTIPLE EXPOSURE PHOTOLITHOGRAPHY METHODS INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2012-07-12 US disclosed
US-20120178027-A1 MULTIPLE EXPOSURE PHOTOLITHOGRAPHY METHODS INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2012-07-12 US disclosed
WO-2009087029-A1 MULTIPLE EXPOSURE PHOTOLITHOGRAPHY METHODS AND PHOTORESIST COMPOSITIONS INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2009-07-16 WO disclosed
US-20090176174-A1 MULTIPLE EXPOSURE PHOTOLITHOGRAPHY METHODS AND PHOTORESIST COMPOSTIONS INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2009-07-09 US disclosed
US-20090176174-A1 MULTIPLE EXPOSURE PHOTOLITHOGRAPHY METHODS AND PHOTORESIST COMPOSTIONS INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2009-07-09 US disclosed
US-7341775-B2 Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device MATSUSHITA ELECTRIC INDUSTRIAL CO. LTD. (JP) 2008-03-11 US disclosed
US-7341775-B2 Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device MATSUSHITA ELECTRIC INDUSTRIAL CO. LTD. (JP) 2008-03-11 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20240254262-A1 DIELECTRIC MATERIALS BASED ON OLIGOAMIDE-EXTENDED BISMALEIMIDES GNE, SMCHD1, KCNE1 RAB9A 3665/4885NPC1 4879/4885HTT 2959/4885
US-20260117026-A1 DIELECTRIC MATERIALS BASED ON HETEROAROMATIC-EXTENDED BISMALEIMIDES KCNE1, GLRB, PBRM1 RAB9A 2755/4885NPC1 4814/4885HTT 4614/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.