Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PTGS2 | P35354 | 3/20 | 0.45 |
| ▸ | CYP11B2 | P19099 | 3/20 | 0.40 |
| ▸ | CYP11B1 | P15538 | 2/20 | 0.38 |
| ▸ | TRPA1 | O75762 | 5/20 | 0.36 |
| ▸ | MAOA | P21397 | 1/20 | 0.36 |
| ▸ | MAOB | P27338 | 1/20 | 0.36 |
| ▸ | ACHE | P22303 | 1/20 | 0.35 |
| ▸ | GPR84 | Q9NQS5 | 1/20 | 0.34 |
| ▸ | MTNR1A | P48039 | 1/20 | 0.33 |
| ▸ | MTNR1B | P49286 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2743954 | 0.78 | CYP11B2 (0.41) | PTGS2CYP11B2CYP11B1TRPA1MAOA | |
| SCHEMBL1452101 | 0.78 | ACHE (0.41) | PTGS2CYP11B2CYP11B1TRPA1MAOA | |
| SCHEMBL15121440 | 0.78 | CYP11B2 (0.41) | PTGS2CYP11B2CYP11B1TRPA1MAOA | |
| SCHEMBL8854215 | 0.76 | ACHE (0.40) | PTGS2CYP11B2CYP11B1TRPA1MAOA | |
| SCHEMBL2235110 | 0.74 | CYP11B2 (0.39) | PTGS2CYP11B2CYP11B1TRPA1MAOA | |
| Hydrochloric Acid SCHEMBL6761120 | 0.74 | ACHE (0.39) | PTGS2CYP11B2CYP11B1TRPA1MAOA | |
| Hydrochloric Acid SCHEMBL8319505 | 0.74 | CYP11B2 (0.42) | PTGS2CYP11B2CYP11B1TRPA1MAOA | |
| Hydrochloric Acid SCHEMBL6761124 | 0.74 | CYP11B2 (0.42) | PTGS2CYP11B2CYP11B1TRPA1MAOA | |
| Hydrochloric Acid SCHEMBL8319503 | 0.74 | CYP11B2 (0.39) | PTGS2CYP11B2CYP11B1TRPA1MAOA | |
| SCHEMBL5083961 | 0.72 | PTGS2 (0.51) | PTGS2CYP11B2CYP11B1ACHE |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 58 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2025022873-A1 | PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, AND COLOR FILTER, SOLID-STATE IMAGING ELEMENT, AND FINGERPRINT AUTHENTICATION DEVICE USING SAID CURED FILM | 東レ株式会社 | 2025-01-30 | — | — | WO | disclosed |
| US-20240045329-A1 | PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, ELECTRONIC COMPONENT, ANTENNA ELEMENT, SEMICONDUCTOR PACKAGE, AND COMPOUND | TORAY INDUSTRIES, INC. (JP) | 2024-02-08 | — | — | US | disclosed |
| US-11650499-B2 | Photosensitive resin composition, organic EL element barrier rib, and organic EL element | SHOWA DENKO K.K. (JP) | 2023-05-16 | — | — | US | disclosed |
| US-11640110-B2 | Resin composition, method for producing heat-resistant resin film, and display device | TORAY INDUSTRIES, INC. (JP) | 2023-05-02 | — | — | US | disclosed |
| WO-2023054226-A1 | PHOTOSENSITIVE RESIN COMPOSITION, MICROLENS | 東レ株式会社 | 2023-04-06 | — | — | WO | disclosed |
| CN-115877663-A | Photosensitive resin composition and method for manufacturing display device using same | 三星显示有限公司 | 2023-03-31 | — | — | CN | disclosed |
| US-20230096077-A1 | PHOTOSENSITIVE RESIN COMPOSITION AND MANUFACTURING METHOD OF DISPLAY DEVICE USING THE SAME | LTC CO., LTD (KR) | 2023-03-30 | — | — | US | disclosed |
| US-11599023-B2 | Photosensitive resin composition, organic EL element barrier rib, and organic EL element | SHOWA DENKO K.K. (JP) | 2023-03-07 | — | — | US | disclosed |
| EP-3369780-B1 | METHOD FOR MANUFACTURING SUBSTRATE AND METHOD FOR MANUFACTURING LIGHT EMITTING ELEMENT USING SAME | TORAY INDUSTRIES (JP) | 2022-10-26 | — | — | EP | disclosed |
| US-20220275241-A1 | PHOTOSENSITIVE RESIN COMPOSITION AND ORGANIC EL ELEMENT PARTITION WALL | SHOWA DENKO K.K. (JP) | 2022-09-01 | — | — | US | disclosed |
| CN-105359037-A | Positive photosensitive resin composition, cured film formed by curing same, and optical device equipped with same | TORAY INDUSTRIES | 2016-02-24 | — | — | CN | disclosed |
| CN-102667625-B | Positive type photosensitive organic compound, the cured film formed by said composition and there is the element of cured film | TORAY INDUSTRIES, INC. (JP) | 2015-11-25 | — | — | CN | disclosed |
| CN-104487516-A | Polysiloxane composition, electrical device, and optical device | TORAY INDUSTRIES | 2015-04-01 | — | — | CN | disclosed |
| US-8828642-B2 | Positive photosensitive resin composition, cured film obtained using same, and optical device | TORAY INDUSTRIES, INC. (JP) | 2014-09-09 | — | — | US | disclosed |
| CN-102472964-B | Positive photosensitive resin composition, cured film obtained using same, and optical device | TORAY INDUSTRIES | 2013-08-07 | — | — | CN | disclosed |
| US-20120237873-A1 | POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM FORMED FROM THE SAME, AND DEVICE HAVING CURED FILM | TORAY INDUSTRIES INC. (JP) | 2012-09-20 | — | — | US | disclosed |
| CN-102667625-A | Positive photosensitive resin composition, cured film formed from the same, and device having cured film | TORAY INDUSTRIES | 2012-09-12 | — | — | CN | disclosed |
| EP-2485091-A1 | POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM OBTAINED USING SAME, AND OPTICAL DEVICE | Toray Industries, Inc. (JP) | 2012-08-08 | — | — | EP | disclosed |
| US-20120178022-A1 | POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM OBTAINED USING SAME, AND OPTICAL DEVICE | TORAY INDUSTRIES, INC. (JP) | 2012-07-12 | — | — | US | disclosed |
| CN-102472964-A | Positive photosensitive resin composition, cured film obtained using same, and optical device | TORAY INDUSTRIES | 2012-05-23 | — | — | CN | disclosed |