SCHEMBL1029435

SCHEMBL1029435

CS(=O)(=O)Oc1cc2ccccc2c2c1C(=O)NC2=O

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.42
MAPT P10636 2/20 0.42
NPSR1 Q6W5P4 1/20 0.42
CDK4 P11802 4/20 0.39
CCND1 P24385 4/20 0.39
KDR P35968 3/20 0.38
CES1 P23141 1/20 0.36
KDM4E B2RXH2 1/20 0.35
GAA P10253 1/20 0.35
MEN1 O00255 1/20 0.35
RAB9A P51151 1/20 0.35
KMT2A Q03164 1/20 0.35
SMN1; SMN2 Q16637 1/20 0.35
CASP3 P42574 1/20 0.35
PARP1 P09874 1/20 0.35
CHEK1 O14757 1/20 0.34
CDK2 P24941 2/20 0.34
CCNE2 O96020 1/20 0.34
CCNE1 P24864 1/20 0.34
GSK3A P49840 2/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1516404 0.82 ADORA2A (0.35) ALDH1A1MAPTNPSR1CDK4CCND1
SCHEMBL7046260 0.81 KMT2A (0.46) ALDH1A1MAPTGAAMEN1KMT2A
SCHEMBL84234 0.80 MAPT (0.33) ALDH1A1MAPTNPSR1CDK4CCND1
SCHEMBL15543485 0.77 CA1 (0.35) ALDH1A1MAPTNPSR1CDK4CCND1
SCHEMBL6942026 0.76 GPR84 (0.49) ALDH1A1MAPTNPSR1CDK4CCND1
SCHEMBL16415844 0.76 CA1 (0.36) ALDH1A1MAPTNPSR1CDK4CCND1
SCHEMBL10132572 0.75 CA2 (0.45) ALDH1A1CDK4CCND1KDM4EGAA
SCHEMBL7430843 0.73 GPR84 (0.41) ALDH1A1MAPTNPSR1CDK4CCND1
SCHEMBL1303983 0.73 MAPT (0.58) ALDH1A1MAPTCDK4CCND1CES1
SCHEMBL1889878 0.73 PARP1 (0.55) ALDH1A1MAPTNPSR1CDK4CCND1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8673537-B2 Photo-curable resin composition, pattern forming method and substrate protecting film, and film-shaped adhesive and adhesive sheet using said composition SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-03-18 US disclosed
EP-2333015-B1 Photo-curable resin composition, pattern forming method and substrate protecting film, and film-shaped adhesive and adhesive sheet using said composition SHINETSU CHEMICAL CO (JP) 2013-07-10 EP disclosed
EP-2384457-A2 COATING COMPOSITIONS AZ Electronic Materials USA Corp. (US) 2011-11-09 EP disclosed
US-20110143103-A1 PHOTO-CURABLE RESIN COMPOSITION, PATTERN FORMING METHOD AND SUBSTRATE PROTECTING FILM, AND FILM-SHAPED ADHESIVE AND ADHESIVE SHEET USING SAID COMPOSITION SHIN-ETSU CHEMICAL CO., LTD. (JP) 2011-06-16 US disclosed
EP-2333015-A2 Photo-curable resin composition, pattern forming method and substrate protecting film, and film-shaped adhesive and adhesive sheet using said composition Shin-Etsu Chemical Co., Ltd. (JP) 2011-06-15 EP disclosed
EP-2273968-A1 COMPOSITIONS AND METHODS INCORPORATING PHOTOCATALYSTS THE PROCTER & GAMBLE COMPANY (US) 2011-01-19 EP disclosed
WO-2010055406-A2 COATING COMPOSITIONS AZ ELECTRONIC MATERIALS USA CORP. (US) 2010-05-20 WO disclosed
WO-2009140076-A1 COMPOSITIONS AND METHODS INCORPORATING PHOTOCATALYSTS THE PROCTER & GAMBLE COMPANY (US) 2009-11-19 WO disclosed