SCHEMBL10312334

SCHEMBL10312334

C[Si](C)(C)CCCNS(=O)(=O)c1ccc(O)cc1

nearest known ligand 0.49

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 8/20 0.49
PKM P14618 3/20 0.49
KMT2A Q03164 2/20 0.47
MEN1 O00255 1/20 0.47
LMNA P02545 3/20 0.46
SMN1; SMN2 Q16637 3/20 0.46
KDM4E B2RXH2 1/20 0.46
CA12 O43570 2/20 0.45
CA2 P00918 2/20 0.45
CA9 Q16790 2/20 0.45
NPSR1 Q6W5P4 1/20 0.45
HTT P42858 2/20 0.44
ALOX15 P16050 1/20 0.44
POLB P06746 1/20 0.44
TSHR P16473 1/20 0.43
HSD17B10 Q99714 1/20 0.43
MAPK1 P28482 1/20 0.43
CA1 P00915 1/20 0.42
EDNRA P25101 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10907023 0.84 ALDH1A1 (0.58) ALDH1A1PKMKMT2AMEN1LMNA
SCHEMBL10312338 0.83 ALDH1A1 (0.68) ALDH1A1PKMLMNASMN1; SMN2KDM4E
SCHEMBL10908184 0.81 LMNA (0.59) ALDH1A1PKMKMT2AMEN1LMNA
SCHEMBL1465715 0.80 ALDH1A1 (0.57) ALDH1A1PKMKMT2AMEN1LMNA
SCHEMBL9293546 0.79 ALDH1A1 (0.59) ALDH1A1PKMKMT2AMEN1LMNA
SCHEMBL9154917 0.79 ALDH1A1 (0.59) ALDH1A1PKMKMT2AMEN1LMNA
SCHEMBL10906482 0.79 ALDH1A1 (0.59) ALDH1A1PKMKMT2AMEN1LMNA
SCHEMBL7771792 0.75 GAA (0.74) ALDH1A1PKMKMT2AMEN1LMNA
SCHEMBL18227206 0.74 ALDH1A1 (0.64) ALDH1A1PKMLMNASMN1; SMN2KDM4E
SCHEMBL7028080 0.73 TSHR (0.71) ALDH1A1CA12CA2CA9NPSR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8828879-B2 Silicon-containing composition having sulfonamide group for forming resist underlayer film NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2014-09-09 US disclosed
US-20120178261-A1 SILICON-CONTAINING COMPOSITION HAVING SULFONAMIDE GROUP FOR FORMING RESIST UNDERLAYER FILM NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2012-07-12 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20120178261-A1 SILICON-CONTAINING COMPOSITION HAVING SULFONAMIDE GROUP FOR FORMING RESIST UNDERLAYER FILM STS, SI, MUS81 ALDH1A1 2958/4885PKM 2643/4885KMT2A 23/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.