SCHEMBL10312338

SCHEMBL10312338

C[Si](C)(C)CCCNS(=O)(=O)c1ccccc1

nearest known ligand 0.68

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 8/20 0.68
KDM4E B2RXH2 1/20 0.68
LMNA P02545 1/20 0.68
PKM P14618 1/20 0.68
SMN1; SMN2 Q16637 1/20 0.68
MAPK1 P28482 1/20 0.61
TSHR P16473 1/20 0.56
TBXA2R P21731 2/20 0.55
NPSR1 Q6W5P4 2/20 0.51
TDP1 Q9NUW8 1/20 0.51
EPHX2 P34913 1/20 0.49
USP2 O75604 1/20 0.49
TP53 P04637 1/20 0.49
GAA P10253 1/20 0.49
KEAP1 Q14145 1/20 0.49

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL31650493 0.89 ALDH1A1 (0.61) ALDH1A1KDM4ELMNAPKMSMN1; SMN2
SCHEMBL18227206 0.87 ALDH1A1 (0.64) ALDH1A1KDM4ELMNAPKMSMN1; SMN2
SCHEMBL18237754 0.85 ALDH1A1 (0.62) ALDH1A1KDM4ELMNAPKMSMN1; SMN2
SCHEMBL10312334 0.83 ALDH1A1 (0.49) ALDH1A1KDM4ELMNAPKMSMN1; SMN2
SCHEMBL10453840 0.83 ALDH1A1 (0.96) ALDH1A1KDM4ELMNAPKMSMN1; SMN2
SCHEMBL19755165 0.83 ALDH1A1 (0.68) ALDH1A1KDM4ELMNAPKMSMN1; SMN2
SCHEMBL14150586 0.82 MAPK1 (0.65) ALDH1A1KDM4ELMNAPKMSMN1; SMN2
SCHEMBL9577143 0.81 ALDH1A1 (1.00) ALDH1A1KDM4ELMNAPKMSMN1; SMN2
SCHEMBL21048464 0.81 ALDH1A1 (1.00) ALDH1A1KDM4ELMNAPKMSMN1; SMN2
SCHEMBL12672471 0.81 ALDH1A1 (1.00) ALDH1A1KDM4ELMNAPKMSMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8828879-B2 Silicon-containing composition having sulfonamide group for forming resist underlayer film NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2014-09-09 US disclosed
US-20120178261-A1 SILICON-CONTAINING COMPOSITION HAVING SULFONAMIDE GROUP FOR FORMING RESIST UNDERLAYER FILM NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2012-07-12 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20120178261-A1 SILICON-CONTAINING COMPOSITION HAVING SULFONAMIDE GROUP FOR FORMING RESIST UNDERLAYER FILM STS, SI, MUS81 ALDH1A1 2958/4885KDM4E 115/4885LMNA 727/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.