Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HPGD | P15428 | 1/20 | 0.49 |
| ▸ | RECQL | P46063 | 1/20 | 0.47 |
| ▸ | EPHX1 | P07099 | 1/20 | 0.47 |
| ▸ | USP2 | O75604 | 1/20 | 0.45 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.45 |
| ▸ | GPR119 | Q8TDV5 | 9/20 | 0.44 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.43 |
| ▸ | MAPT | P10636 | 1/20 | 0.43 |
| ▸ | THRB | P10828 | 1/20 | 0.43 |
| ▸ | PTPN2 | P17706 | 1/20 | 0.43 |
| ▸ | PTPN1 | P18031 | 1/20 | 0.43 |
| ▸ | PTPN6 | P29350 | 1/20 | 0.43 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3455623 | 0.94 | HPGD (0.47) | HPGDRECQLEPHX1USP2SMN1; SMN2 | |
| SCHEMBL17721273 | 0.88 | HPGD (0.36) | HPGDRECQLEPHX1GPR119KDM4E | |
| SCHEMBL10329344 | 0.86 | HPGD (0.36) | HPGDRECQLEPHX1GPR119 | |
| SCHEMBL3456672 | 0.86 | HPGD (0.48) | HPGDRECQLEPHX1USP2SMN1; SMN2 | |
| SCHEMBL10321396 | 0.85 | HPGD (0.42) | HPGDRECQLEPHX1USP2SMN1; SMN2 | |
| SCHEMBL1024755 | 0.84 | HPGD (0.54) | HPGDRECQLEPHX1USP2SMN1; SMN2 | |
| SCHEMBL14999243 | 0.83 | ALDH1A1 (0.41) | EPHX1USP2MAPTTHRBALDH1A1 | |
| SCHEMBL6937576 | 0.82 | EPHX1 (0.56) | HPGDRECQLEPHX1USP2SMN1; SMN2 | |
| SCHEMBL10329341 | 0.81 | HPGD (0.39) | HPGDRECQLEPHX1SMN1; SMN2GPR119 | |
| SCHEMBL16144934 | 0.81 | NAMPT (0.34) | SMN1; SMN2ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 60 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119875033-A | Silicon-containing copolymer, oil-proof waterproof agent for paper, and preparation method and application thereof | 浙江阪藤科技有限公司 | 2025-04-25 | — | — | CN | disclosed |
| US-20250076764-A1 | RESIST TOPCOAT COMPOSITION, AND METHOD OF FORMING PATTERNS USING THE COMPOSITION | SAMSUNG SDI CO., LTD. (KR) | 2025-03-06 | — | — | US | disclosed |
| CN-119535885-A | Resist topcoat composition and method of forming pattern using the same | 三星SDI株式会社 | 2025-02-28 | — | — | CN | disclosed |
| US-20240026051-A1 | CATIONIC CYCLIC AMINE AND AMPHIPATHIC TRANSFECTION REAGENTS | MIRUS BIO LLC | 2024-01-25 | — | — | US | disclosed |
| US-11739174-B2 | Cationic cyclic amine and amphipathic transfection reagents | MIRUS BIO LLC (US) | 2023-08-29 | — | — | US | disclosed |
| CN-106094431-B | Photoresist composition and method | 罗门哈斯电子材料韩国有限公司 | 2020-06-26 | — | — | CN | disclosed |
| US-20190204742-A1 | PATTERN FORMATION METHODS | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2019-07-04 | — | — | US | disclosed |
| US-9703200-B2 | Photolithographic methods | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2017-07-11 | — | — | US | disclosed |
| US-9703200-B2 | Photolithographic methods | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2017-07-11 | — | — | US | disclosed |
| US-9671697-B2 | Pattern treatment methods | DOW GLOBAL TECHNOLOGIES LLC (US) | 2017-06-06 | — | — | US | disclosed |
| US-20120183904-A1 | NITROGEN-CONTAINING MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-07-19 | — | — | US | disclosed |
| US-20120183903-A1 | PATTERNING PROCESS AND RESIST COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-07-19 | — | — | US | disclosed |
| US-20120183904-A1 | NITROGEN-CONTAINING MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-07-19 | — | — | US | disclosed |
| US-20120183904-A1 | NITROGEN-CONTAINING MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-07-19 | — | — | US | disclosed |
| US-20120183903-A1 | PATTERNING PROCESS AND RESIST COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-07-19 | — | — | US | disclosed |
| US-20120183903-A1 | PATTERNING PROCESS AND RESIST COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-07-19 | — | — | US | disclosed |
| US-20120171612-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN FORMATION METHOD, AND POLYMER | JSR CORPORATION (JP) | 2012-07-05 | — | — | US | disclosed |
| US-20120171612-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN FORMATION METHOD, AND POLYMER | JSR CORPORATION (JP) | 2012-07-05 | — | — | US | disclosed |
| WO-2011037246-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN FORMATION METHOD, AND POLYMER | JSR株式会社 (JP) | 2011-03-31 | — | — | WO | disclosed |
| US-20100151388-A1 | (Meth)acrylate compound, photosensitive polymer, and resist composition including the same | CHEIL INDUSTRIES, INC. (KR) | 2010-06-17 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20100151388-A1 | (Meth)acrylate compound, photosensitive polymer, and resist composition including the same | MMAB, TET1, MAT1A | HPGD 2478/4885RECQL 2094/4885EPHX1 4159/4885 |
| US-20120183904-A1 | NITROGEN-CONTAINING MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS | PARG, PCNA, PAM | HPGD 1852/4885RECQL 2022/4885EPHX1 4161/4885 |
| US-20240026051-A1 | CATIONIC CYCLIC AMINE AND AMPHIPATHIC TRANSFECTION REAGENTS | SLC7A1, PARN, PARG | HPGD 4155/4885RECQL 1084/4885EPHX1 4508/4885 |
| US-11739174-B2 | Cationic cyclic amine and amphipathic transfection reagents | SLC7A1, PARN, PARG | HPGD 4155/4885RECQL 1084/4885EPHX1 4508/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.