SCHEMBL10329359

SCHEMBL10329359

C=CCOC(=O)N1CCC(OC(=O)COC(=O)C(=C)C)CC1

nearest known ligand 0.34

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GPR119 Q8TDV5 1/20 0.34
F10 P00742 2/20 0.34
PLG P00747 2/20 0.34
F2 P00734 1/20 0.34
RAB9A P51151 2/20 0.33
GAA P10253 1/20 0.33
LMNA P02545 1/20 0.33
MAPK1 P28482 1/20 0.33
ALDH1A1 P00352 4/20 0.33
NOS3 P29474 1/20 0.33
NOS2 P35228 1/20 0.33
MAPT P10636 1/20 0.32
SMN1; SMN2 Q16637 1/20 0.32
THRB P10828 1/20 0.32
ATM Q13315 1/20 0.32
L3MBTL1 Q9Y468 1/20 0.32
PRSS1 P07477 1/20 0.31
PRSS2 P07478 1/20 0.31
PRSS3 P35030 1/20 0.31
FAAH O00519 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10329362 0.95 F10 (0.35) GPR119F10PLGF2RAB9A
SCHEMBL10322328 0.89 GAA (0.37) GPR119F10PLGF2RAB9A
SCHEMBL10329353 0.86 SMN1; SMN2 (0.36) GPR119F10PLGF2RAB9A
SCHEMBL10329356 0.84 F10 (0.38) GPR119F10PLGF2RAB9A
SCHEMBL10329355 0.82 SMN1; SMN2 (0.37) GPR119F10PLGF2RAB9A
SCHEMBL10321396 0.81 HPGD (0.42) GPR119MAPTSMN1; SMN2THRB
SCHEMBL10329357 0.79 CETP (0.33) GPR119RAB9AGAAALDH1A1NOS3
SCHEMBL10329348 0.79 ALDH1A1 (0.31) ALDH1A1
SCHEMBL10329347 0.78 SMN1; SMN2 (0.55) RAB9AALDH1A1SMN1; SMN2
SCHEMBL10329351 0.77 HPGD (0.40) GPR119ALDH1A1MAPTSMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9207534-B2 Nitrogen-containing monomer, polymer, resist composition, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-12-08 US disclosed
US-9207534-B2 Nitrogen-containing monomer, polymer, resist composition, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-12-08 US disclosed
US-20120183904-A1 NITROGEN-CONTAINING MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-07-19 US disclosed
US-20120183904-A1 NITROGEN-CONTAINING MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-07-19 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20120183904-A1 NITROGEN-CONTAINING MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS PARG, PCNA, PAM GPR119 4159/4885F10 2842/4885PLG 1359/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.