SCHEMBL10329356

SCHEMBL10329356

C=CCOC(=O)N1CCC(OC(=O)C(=C)C)C1

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
F10 P00742 2/20 0.38
PLG P00747 2/20 0.38
PRSS1 P07477 1/20 0.38
PRSS2 P07478 1/20 0.38
PRSS3 P35030 1/20 0.38
GPR119 Q8TDV5 1/20 0.36
GAA P10253 1/20 0.35
F2 P00734 1/20 0.35
LMNA P02545 1/20 0.35
MAPK1 P28482 1/20 0.35
RAB9A P51151 1/20 0.35
NOS3 P29474 1/20 0.35
NOS2 P35228 1/20 0.35
THRB P10828 1/20 0.33
ATM Q13315 1/20 0.33
L3MBTL1 Q9Y468 1/20 0.33
NR1D1 P20393 1/20 0.33
ALDH1A1 P00352 3/20 0.33
CHRM1 P11229 2/20 0.32
ERN1 O75460 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10322328 0.95 GAA (0.37) F10PLGPRSS1PRSS2PRSS3
SCHEMBL10329362 0.89 F10 (0.35) F10PLGPRSS1PRSS2PRSS3
SCHEMBL10329355 0.85 SMN1; SMN2 (0.37) F10PLGPRSS1PRSS2PRSS3
SCHEMBL10329359 0.84 GPR119 (0.34) F10PLGPRSS1PRSS2PRSS3
SCHEMBL14999238 0.80 GAA (0.51) GAANOS3NOS2THRBATM
SCHEMBL10329353 0.80 SMN1; SMN2 (0.36) F10PLGGPR119GAAF2
SCHEMBL13978434 0.77 F10 (0.42) F10PLGPRSS1PRSS2PRSS3
SCHEMBL7540588 0.77 F10 (0.42) F10PLGPRSS1PRSS2PRSS3
SCHEMBL31682843 0.77 F10 (0.42) F10PLGPRSS1PRSS2PRSS3
SCHEMBL3455623 0.77 HPGD (0.47) GPR119THRBPIK3CD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9207534-B2 Nitrogen-containing monomer, polymer, resist composition, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-12-08 US disclosed
US-9207534-B2 Nitrogen-containing monomer, polymer, resist composition, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-12-08 US disclosed
US-20120183904-A1 NITROGEN-CONTAINING MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-07-19 US disclosed
US-20120183904-A1 NITROGEN-CONTAINING MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-07-19 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20120183904-A1 NITROGEN-CONTAINING MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS PARG, PCNA, PAM F10 2842/4885PLG 1359/4885PRSS1 4579/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.