SCHEMBL10344111

SCHEMBL10344111

CNc1c(C)cc(-c2ccc3c(c2-c2cc(C)c(NC)c(C)c2)Cc2ccccc2-3)cc1C

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PGR P06401 1/20 0.41
NPC1 O15118 3/20 0.37
RAB9A P51151 3/20 0.37
PNMT P11086 1/20 0.35
MAPT P10636 2/20 0.34
HPGD P15428 2/20 0.34
SMN1; SMN2 Q16637 2/20 0.34
ALDH1A1 P00352 2/20 0.34
KDM4E B2RXH2 1/20 0.34
LMNA P02545 1/20 0.34
CYP1A2 P05177 2/20 0.34
SLC6A2 P23975 2/20 0.34
SLC6A4 P31645 2/20 0.34
HTR2C P28335 2/20 0.34
HTR2B P41595 2/20 0.34
ADRA2A P08913 1/20 0.34
MAOA P21397 1/20 0.34
CYP3A4 P08684 1/20 0.33
HSD17B10 Q99714 1/20 0.32
ADORA2A P29274 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL20640478 0.87 NPC1 (0.42) PGRNPC1RAB9APNMTMAPT
SCHEMBL31030083 0.83 PGR (0.43) PGRNPC1RAB9APNMTMAPT
SCHEMBL28291449 0.83 PGR (0.43) PGRNPC1RAB9APNMTMAPT
SCHEMBL28224970 0.83 PGR (0.43) PGRNPC1RAB9APNMTMAPT
SCHEMBL28263354 0.83 PNMT (0.38) PGRNPC1RAB9APNMTMAPT
SCHEMBL8984737 0.76 PGR (0.47) PGRNPC1RAB9APNMTMAPT
SCHEMBL8981606 0.75 PGR (0.41) PGRNPC1RAB9APNMTMAPT
SCHEMBL28887059 0.75 ALDH1A1 (0.40) PGRPNMTMAPTHPGDSMN1; SMN2
SCHEMBL29921844 0.75 TLR8 (0.42) PGRNPC1RAB9APNMTMAPT
SCHEMBL30314491 0.75 TLR8 (0.42) PGRNPC1RAB9APNMTMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-110114384-A Curable compositions 3M创新有限公司 2019-08-09 CN disclosed
CN-109021982-A Liquid crystal alignment agent, manufacturing method of liquid crystal alignment film and liquid crystal display assembly 奇美实业股份有限公司 2018-12-18 CN disclosed
EP-0203828-B1 EPOXY RESIN CURING AGENT, CURING PROCESS AND COMPOSITION CONTAINING IT MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1990-03-28 EP disclosed